Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): ##STR00001##
(wherein R.sub.1 represents a hydrogen atom or a methyl group, R.sub.2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): ##STR00001##
(wherein R.sub.1 represents a hydrogen atom or a methyl group, R.sub.2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

A curable composition set containing: a first liquid containing an oxidizing agent; and a second liquid containing a reducing agent, wherein at least one of the first liquid and the second liquid contains a compound represented by the following formula (1):

##STR00001##

wherein R.sup.11 and R.sup.12 each independently represent a hydrogen atom or a methyl group, and R.sup.13 represents a divalent group having a polyoxyalkylene chain, and wherein at least one of the first liquid and the second liquid contains a thermally conductive filler.

A composition containing a compound represented by the following formula (1):

##STR00001##

wherein R.sup.11 and R.sup.12 each independently represent a hydrogen atom or a methyl group, and R.sup.13 represents a divalent group having a polyoxyalkylene chain, and wherein the polyoxyalkylene chain has 100 or more of oxyalkylene groups.

A compound expressed in the following formula (1) ##STR00001##
(where R.sup.1 and R.sup.2 independently denote a hydrogen atom or a methyl group, Y.sup.1 and Y.sup.2 independently denote an alkylene group having a carbon number of 1 to 9, and n.sup.1 and n.sup.2 independently denote an integer of 0 to 3).

A compound expressed in the following formula (1) ##STR00001##
(where R.sup.1 and R.sup.2 independently denote a hydrogen atom or a methyl group, Y.sup.1 and Y.sup.2 independently denote an alkylene group having a carbon number of 1 to 9, and n.sup.1 and n.sup.2 independently denote an integer of 0 to 3).

The present disclosure relates to a composition that includes a first repeat unit defined by ##STR00001##
where R includes a first hydrocarbon chain that includes at least one olefinic bond, R.sub.5 includes a second hydrocarbon chain, the second hydrocarbon chain may be saturated, and n may be between 2 and 1,000.

The present disclosure relates to a composition that includes a first repeat unit defined by ##STR00001##
where R includes a first hydrocarbon chain that includes at least one olefinic bond, R.sub.5 includes a second hydrocarbon chain, the second hydrocarbon chain may be saturated, and n may be between 2 and 1,000.

The present disclosure provides compositions and methods for metathesizing a first alkenyl or alkynyl group with a second alkenyl or alkynyl group, the composition comprising a ruthenium metathesis catalyst and a photoredox catalyst that is activated by visible light.

The present disclosure provides compositions and methods for metathesizing a first alkenyl or alkynyl group with a second alkenyl or alkynyl group, the composition comprising a ruthenium metathesis catalyst and a photoredox catalyst that is activated by visible light.