Patent classifications
C07C69/616
Hybrid photoinitiators
Compounds of the formula I ##STR00001##
wherein m is 1 or 2; R.sub.1, R.sub.2, R.sub.4 and R.sub.5 independently of one another are hydrogen, C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7 cycloalkyl, phenyl, C.sub.1-C.sub.4alkoxy, C.sub.5-C.sub.7cycloalkoxy or phenoxy; R.sub.3, if m is 1, has one of the meanings as given above for R.sub.1, R.sub.2, R.sub.4 and R.sub.5; R.sub.3, if m is 2, is a divalent group; R.sub.6 is hydrogen or C.sub.1-C.sub.4alkyl; R.sub.7 is hydrogen, and if R.sub.6 is hydrogen then R.sub.7 may additionally be C.sub.1-C.sub.4alkyl; R.sub.8 is group A or B ##STR00002## X is O, OCH.sub.2 or O(CHR.sub.14); n is 0-10; provided that (i) if n is 0, and X is O, then R.sub.8 is a group A; (ii) if n is other than 0, then X is O and R.sub.8 is the group A; R.sub.9 and R.sub.10 independently of one another are hydrogen or C.sub.1-C.sub.4alkyl; R.sub.11 and R.sub.12 independently of one another are C.sub.1-C.sub.4alkyl or form together with the C atom to which they are attached a 5 to 7 membered saturated carbocyclic ring; R.sub.13 is hydrogen, C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7cycloalkyl, 2-tetrahydropyranyl or Si(C.sub.1-C.sub.4alkyl).sub.3; R.sub.14 is a group A ##STR00003##
and R.sub.13 has one of the meanings as given for R.sub.13 or is the group C ##STR00004##
are effective photoinitiator compounds.
Hybrid photoinitiators
Compounds of the formula I ##STR00001##
wherein m is 1 or 2; R.sub.1, R.sub.2, R.sub.4 and R.sub.5 independently of one another are hydrogen, C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7 cycloalkyl, phenyl, C.sub.1-C.sub.4alkoxy, C.sub.5-C.sub.7cycloalkoxy or phenoxy; R.sub.3, if m is 1, has one of the meanings as given above for R.sub.1, R.sub.2, R.sub.4 and R.sub.5; R.sub.3, if m is 2, is a divalent group; R.sub.6 is hydrogen or C.sub.1-C.sub.4alkyl; R.sub.7 is hydrogen, and if R.sub.6 is hydrogen then R.sub.7 may additionally be C.sub.1-C.sub.4alkyl; R.sub.8 is group A or B ##STR00002## X is O, OCH.sub.2 or O(CHR.sub.14); n is 0-10; provided that (i) if n is 0, and X is O, then R.sub.8 is a group A; (ii) if n is other than 0, then X is O and R.sub.8 is the group A; R.sub.9 and R.sub.10 independently of one another are hydrogen or C.sub.1-C.sub.4alkyl; R.sub.11 and R.sub.12 independently of one another are C.sub.1-C.sub.4alkyl or form together with the C atom to which they are attached a 5 to 7 membered saturated carbocyclic ring; R.sub.13 is hydrogen, C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7cycloalkyl, 2-tetrahydropyranyl or Si(C.sub.1-C.sub.4alkyl).sub.3; R.sub.14 is a group A ##STR00003##
and R.sub.13 has one of the meanings as given for R.sub.13 or is the group C ##STR00004##
are effective photoinitiator compounds.
Process for the synthesis of [6,6]-phenyl-C61butyric acid pentyl ester (PC61BP)
A total green, eco-friendly process for the synthesis of new acceptor molecule [6,6]-phenyl-C.sub.61-butyric acid pentyl ester (PC61BP) in high yields is carried under aerobic conditions showing better performance as acceptor in organic solar cells. More importantly this process causes the low cost synthesis of PC61BP in good yield without involving harmful and costly catalysts or chemicals.
Process for the synthesis of [6,6]-phenyl-C61butyric acid pentyl ester (PC61BP)
A total green, eco-friendly process for the synthesis of new acceptor molecule [6,6]-phenyl-C.sub.61-butyric acid pentyl ester (PC61BP) in high yields is carried under aerobic conditions showing better performance as acceptor in organic solar cells. More importantly this process causes the low cost synthesis of PC61BP in good yield without involving harmful and costly catalysts or chemicals.
MANDELIC ACID CONDENSATION POLYMERS
Disclosed herein are compounds and compositions useful for reducing the risk of infection. In particular, disclosed herein are mandelic acid condensation polymers, compositions comprising such compounds, processes for producing such compounds, and methods of using such compounds.
Composition, resist underlayer film, method of forming film, method of producing patterned substrate, and compound
A composition includes: a compound including an aromatic hydrocarbon ring structure, and a partial structure represented by formula (1) which bonds to the aromatic hydrocarbon ring structure; and a solvent. The aromatic hydrocarbon ring structure has no fewer than 25 carbon atoms. In the formula (1), X represents a group represented by formula (i), (ii), (iii), or (iv); and *'s denote binding sites to two adjacent carbon atoms constituting the aromatic hydrocarbon ring structure. A method of producing a patterned substrate, includes applying the composition directly or indirectly on a substrate to form a resist underlayer film; forming a resist pattern directly or indirectly on the resist underlayer film; and carrying out etching using the resist pattern as a mask. ##STR00001##
Composition, resist underlayer film, method of forming film, method of producing patterned substrate, and compound
A composition includes: a compound including an aromatic hydrocarbon ring structure, and a partial structure represented by formula (1) which bonds to the aromatic hydrocarbon ring structure; and a solvent. The aromatic hydrocarbon ring structure has no fewer than 25 carbon atoms. In the formula (1), X represents a group represented by formula (i), (ii), (iii), or (iv); and *'s denote binding sites to two adjacent carbon atoms constituting the aromatic hydrocarbon ring structure. A method of producing a patterned substrate, includes applying the composition directly or indirectly on a substrate to form a resist underlayer film; forming a resist pattern directly or indirectly on the resist underlayer film; and carrying out etching using the resist pattern as a mask. ##STR00001##
Compound, curable resin composition, cured product, optical member, and lens
Provided are the following compound represented by General Formula (A) or (B), a curable resin composition including the compound, a cured product thereof, an optical member, and a lens: ##STR00001##
A ring Ar.sup.1 and a ring Ar.sup.2 represent an aromatic ring represented by a specific formula or a fused ring thereof, R.sup.1 and R.sup.2 represent a specific substituent, and v and w are a specific integer. R.sup.3 and R.sup.4 represent a hydrogen atom or a monovalent substituent, L.sup.1 and L.sup.2 represent an alkylene group having 1 to 6 carbon atoms, and Sp.sup.a to Sp.sup.d represent a single bond or a divalent linking group. Pol.sup.1 and Pol.sup.2 represent a hydrogen atom or a polymerizable group, in which at least one of Pol.sup.1 or Pol.sup.2 is a polymerizable group. Further, in the formulae, a structure represented by (R.sup.1).sub.vAr.sup.1/cyclopentadiene skeleton/Ar.sup.2(R.sup.2).sub.w is not line-symmetrical.
Compound, curable resin composition, cured product, optical member, and lens
Provided are the following compound represented by General Formula (A) or (B), a curable resin composition including the compound, a cured product thereof, an optical member, and a lens: ##STR00001##
A ring Ar.sup.1 and a ring Ar.sup.2 represent an aromatic ring represented by a specific formula or a fused ring thereof, R.sup.1 and R.sup.2 represent a specific substituent, and v and w are a specific integer. R.sup.3 and R.sup.4 represent a hydrogen atom or a monovalent substituent, L.sup.1 and L.sup.2 represent an alkylene group having 1 to 6 carbon atoms, and Sp.sup.a to Sp.sup.d represent a single bond or a divalent linking group. Pol.sup.1 and Pol.sup.2 represent a hydrogen atom or a polymerizable group, in which at least one of Pol.sup.1 or Pol.sup.2 is a polymerizable group. Further, in the formulae, a structure represented by (R.sup.1).sub.vAr.sup.1/cyclopentadiene skeleton/Ar.sup.2(R.sup.2).sub.w is not line-symmetrical.