Patent classifications
C07C69/63
Thiopyranose compound and method for producing same
There is provided a production method of a thiopyranose compound represented by the following Formula (2) by reacting a compound represented by the following Formula (1) with a sulfur compound. ##STR00001##
X represents a leaving group. A represents an oxygen atom or a sulfur atom. Further, each of R.sup.1A to R.sup.4B, R.sup.1B to R.sup.4B, and R.sup.5 represents a hydrogen atom or a specific substituent.
Process for the high-yield preparation of P-(R)calix[9-20]arenes
A process for the high-yield preparation of p-(R)calix[9-20]arenes.
Process for the high-yield preparation of P-(R)calix[9-20]arenes
A process for the high-yield preparation of p-(R)calix[9-20]arenes.
One-component reagent for the fluoroalkylation reaction
A composition, consisting essentially of copper, a fluoroalkyl group, and a ligand comprising at least one group-V donor. The molar ratio of copper to the fluoroalkyl group is approximately 1.
One-component reagent for the fluoroalkylation reaction
A composition, consisting essentially of copper, a fluoroalkyl group, and a ligand comprising at least one group-V donor. The molar ratio of copper to the fluoroalkyl group is approximately 1.
Method for producing fluorinated organic compound and fluorinating reagent
Object: An object of the present invention is to provide a method for producing, with a high yield, a fluorinated organic compound, the fluorinated organic compound having not been produced with a sufficient yield by a conventional method for producing a fluorinated organic compound using a fluorinating agent containing IF.sub.5-pyridine-HF alone. Another object of the present invention is to provide a fluorinating reagent. Means for achieving the object: A method for producing a fluorinated organic compound comprising step A of fluorinating an organic compound by bringing the organic compound into contact with (1) IF.sub.5-pyridine-HF and (2) at least one additive selected from the group consisting of amine hydrogen fluorides, X.sup.aF (wherein X.sup.a represents hydrogen, potassium, sodium, or lithium), oxidizers, and reducing agents.
Method for producing fluorinated organic compound and fluorinating reagent
Object: An object of the present invention is to provide a method for producing, with a high yield, a fluorinated organic compound, the fluorinated organic compound having not been produced with a sufficient yield by a conventional method for producing a fluorinated organic compound using a fluorinating agent containing IF.sub.5-pyridine-HF alone. Another object of the present invention is to provide a fluorinating reagent. Means for achieving the object: A method for producing a fluorinated organic compound comprising step A of fluorinating an organic compound by bringing the organic compound into contact with (1) IF.sub.5-pyridine-HF and (2) at least one additive selected from the group consisting of amine hydrogen fluorides, X.sup.aF (wherein X.sup.a represents hydrogen, potassium, sodium, or lithium), oxidizers, and reducing agents.
Salt, acid generator, resist composition and method for producing resist pattern
A salt having a group represented by formula (a): ##STR00001## wherein X.sup.a and X.sup.b each independently represent an oxygen atom or a sulfur atom, X.sup.1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.
Salt, acid generator, resist composition and method for producing resist pattern
A salt having a group represented by formula (a): ##STR00001## wherein X.sup.a and X.sup.b each independently represent an oxygen atom or a sulfur atom, X.sup.1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.
##STR00001##