C07C211/63

METHOD FOR PRODUCING HALOGEN OXYACID SOLUTION

A method for producing halogen oxyacid, which includes a step of continuously supplying and mixing an organic alkali solution and a halogen and continuously collecting a reaction solution containing halogen oxyacid, and an production apparatus of halogen oxyacid, which includes a reactor, a means of supplying an organic alkali solution to the reactor, a means of supplying a halogen to the reactor, and a means of collecting a reaction solution for taking out the reaction solution from the reactor, in which the organic alkali solution and the halogen are continuously supplied by the means of supplying an organic alkali solution and the means of supplying a halogen, respectively, to the reactor so as to be mixed therein such that a solution containing halogen oxyacid is generated as a reaction solution, and the reaction solution is continuously collected by the means of collecting a reaction solution are provided.

COMPOUNDS FOR USE IN PCR SYSTEMS AND APPLICATIONS THEREOF
20230100065 · 2023-03-30 ·

This disclosure relates to novel compounds for use in various compositions, kits and methods, including, for example, use in polymerase storage buffers and in nucleic acid synthesis or amplification reactions such as a polymerase chain reaction (PCR). Methods for preparing the novel compounds are also described.

COMPOUNDS FOR USE IN PCR SYSTEMS AND APPLICATIONS THEREOF
20230100065 · 2023-03-30 ·

This disclosure relates to novel compounds for use in various compositions, kits and methods, including, for example, use in polymerase storage buffers and in nucleic acid synthesis or amplification reactions such as a polymerase chain reaction (PCR). Methods for preparing the novel compounds are also described.

Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer

A method for producing a quaternary alkylammonium hypochlorite solution includes a preparation step of preparing a quaternary alkylammonium hydroxide solution, and a reaction step of bringing the quaternary alkylammonium hydroxide solution into contact with chlorine, wherein a carbon dioxide concentration in a gas phase portion in the reaction step is 100 ppm by volume or less, and pH of a liquid phase portion in the reaction step is 10.5 or more.

Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer

A method for producing a quaternary alkylammonium hypochlorite solution includes a preparation step of preparing a quaternary alkylammonium hydroxide solution, and a reaction step of bringing the quaternary alkylammonium hydroxide solution into contact with chlorine, wherein a carbon dioxide concentration in a gas phase portion in the reaction step is 100 ppm by volume or less, and pH of a liquid phase portion in the reaction step is 10.5 or more.

Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer

A method for producing a quaternary alkylammonium hypochlorite solution includes a preparation step of preparing a quaternary alkylammonium hydroxide solution, and a reaction step of bringing the quaternary alkylammonium hydroxide solution into contact with chlorine, wherein a carbon dioxide concentration in a gas phase portion in the reaction step is 100 ppm by volume or less, and pH of a liquid phase portion in the reaction step is 10.5 or more.

IONIC LIQUID COMPOSITION FOR CARBON DIOXIDE SEPARATION MEMBRANE, CARBON DIOXIDE SEPARATION MEMBRANE HOLDING SAID COMPOSITION, AND CARBON DIOXIDE CONCENTRATION APPARATUS PROVIDED WITH SAID CARBON DIOXIDE SEPARATION MEMBRANE
20230099980 · 2023-03-30 ·

Provide are an ionic liquid composition for a carbon dioxide separation membrane, a carbon dioxide separation membrane retaining the composition in voids, and a carbon dioxide concentration apparatus provided with the carbon dioxide separation membrane that can be used to separate carbon dioxide from high partial pressure to low partial pressure. The permeability of CO.sub.2 and CO.sub.2 selectivity ratio of the carbon dioxide separation membrane can be improved, and carbon dioxide from high partial pressure to a low partial pressure of 1 kPa or lower can be selectively separated and recycled by using an ionic liquid composition prepared by combining: an ionic liquid (I) that is an aminium having one or more primary or secondary amino groups and an ethylenediamine or propylenediamine backbone in the cation; and an ionic liquid (II) in which the cation has no primary or secondary amino group and the anion is an oxoacid anion.

IONIC LIQUID COMPOSITION FOR CARBON DIOXIDE SEPARATION MEMBRANE, CARBON DIOXIDE SEPARATION MEMBRANE HOLDING SAID COMPOSITION, AND CARBON DIOXIDE CONCENTRATION APPARATUS PROVIDED WITH SAID CARBON DIOXIDE SEPARATION MEMBRANE
20230099980 · 2023-03-30 ·

Provide are an ionic liquid composition for a carbon dioxide separation membrane, a carbon dioxide separation membrane retaining the composition in voids, and a carbon dioxide concentration apparatus provided with the carbon dioxide separation membrane that can be used to separate carbon dioxide from high partial pressure to low partial pressure. The permeability of CO.sub.2 and CO.sub.2 selectivity ratio of the carbon dioxide separation membrane can be improved, and carbon dioxide from high partial pressure to a low partial pressure of 1 kPa or lower can be selectively separated and recycled by using an ionic liquid composition prepared by combining: an ionic liquid (I) that is an aminium having one or more primary or secondary amino groups and an ethylenediamine or propylenediamine backbone in the cation; and an ionic liquid (II) in which the cation has no primary or secondary amino group and the anion is an oxoacid anion.

Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers

Provided is a method of producing a quaternary alkyl ammonium hypochlorite solution with an excellent storage stability. Specifically, provided is a method of producing a quaternary alkyl ammonium hypochlorite solution, the method including: a preparation step in which a quaternary alkyl ammonium hydroxide solution is prepared and the concentration of amines in the quaternary alkyl ammonium hydroxide solution is set to 20 ppm by mass or less; and a reaction step in which the quaternary alkyl ammonium hydroxide solution is brought into contact with chlorine gas, wherein the concentration of carbon dioxide of a gas phase in the reaction step is 100 ppm by volume or less and the pH of a liquid phase in the reaction step is 10.5 or more.

Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers

Provided is a method of producing a quaternary alkyl ammonium hypochlorite solution with an excellent storage stability. Specifically, provided is a method of producing a quaternary alkyl ammonium hypochlorite solution, the method including: a preparation step in which a quaternary alkyl ammonium hydroxide solution is prepared and the concentration of amines in the quaternary alkyl ammonium hydroxide solution is set to 20 ppm by mass or less; and a reaction step in which the quaternary alkyl ammonium hydroxide solution is brought into contact with chlorine gas, wherein the concentration of carbon dioxide of a gas phase in the reaction step is 100 ppm by volume or less and the pH of a liquid phase in the reaction step is 10.5 or more.