C07C233/65

SOLVENTS FOR ORGANOMETALLIC REAGENTS
20210178375 · 2021-06-17 ·

In an embodiment, the present disclosure pertains to a solvent including a hydrocarbon oligomer with at least 20 carbon atoms, where the hydrocarbon oligomer has at least one of a low viscosity, a low vapor pressure, and a high flashpoint. In another embodiment, the present disclosure pertains to a solution including a poly(α-olefin) and a reactive organometallic reagent. In a further embodiment, the present disclosure pertains to a solution including an oligomeric hydrocarbon and a reactive organometallic reagent. In an additional embodiment, the present disclosure pertains to a method for creating a solution, where the method includes adding a reactive organometallic reagent to an oligomeric hydrocarbon.

SOLVENTS FOR ORGANOMETALLIC REAGENTS
20210178375 · 2021-06-17 ·

In an embodiment, the present disclosure pertains to a solvent including a hydrocarbon oligomer with at least 20 carbon atoms, where the hydrocarbon oligomer has at least one of a low viscosity, a low vapor pressure, and a high flashpoint. In another embodiment, the present disclosure pertains to a solution including a poly(α-olefin) and a reactive organometallic reagent. In a further embodiment, the present disclosure pertains to a solution including an oligomeric hydrocarbon and a reactive organometallic reagent. In an additional embodiment, the present disclosure pertains to a method for creating a solution, where the method includes adding a reactive organometallic reagent to an oligomeric hydrocarbon.

MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND

The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10, and R.sub.1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q.sub.1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X.sub.1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R.sub.2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.

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MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND

The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10, and R.sub.1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q.sub.1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X.sub.1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R.sub.2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.

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TRISAMIDE COMPOUNDS AND COMPOSITIONS COMPRISING THE SAME

A trisamide compound has the structure of Formula (I)

##STR00001##

in which R.sup.1, R.sup.2, and R.sup.3 are independently selected from the group consisting of alkyl groups. A polymer composition comprises a trisamide compound of Formula (I) and a polyolefin polymer. The polymer compositions containing a trisamide compound of Formula (I) exhibit very low haze levels and minimal extraction of the trisamide compound.

TRISAMIDE COMPOUNDS AND COMPOSITIONS COMPRISING THE SAME

A trisamide compound has the structure of Formula (I)

##STR00001##

in which R.sup.1, R.sup.2, and R.sup.3 are independently selected from the group consisting of alkyl groups. A polymer composition comprises a trisamide compound of Formula (I) and a polyolefin polymer. The polymer compositions containing a trisamide compound of Formula (I) exhibit very low haze levels and minimal extraction of the trisamide compound.

ANTIFREEZING COOLANT COMPOSITION NOT INCLUDING GLYCOL
20210189214 · 2021-06-24 ·

Disclosed is an antifreezing coolant composition, which does not include glycol but includes environmentally friendly materials, such as a carboxylic acid salt, an anthranilamide compound, a corrosion inhibitor and a triazole compound. The antifreezing coolant composition may form a thin film on the metal surface in cooling systems for vehicles to thereby exhibit high corrosion resistance at low and high temperatures, superior antifreezing performance at low temperatures, and superior cooling performance at high temperatures.

ANTIFREEZING COOLANT COMPOSITION NOT INCLUDING GLYCOL
20210189214 · 2021-06-24 ·

Disclosed is an antifreezing coolant composition, which does not include glycol but includes environmentally friendly materials, such as a carboxylic acid salt, an anthranilamide compound, a corrosion inhibitor and a triazole compound. The antifreezing coolant composition may form a thin film on the metal surface in cooling systems for vehicles to thereby exhibit high corrosion resistance at low and high temperatures, superior antifreezing performance at low temperatures, and superior cooling performance at high temperatures.

METHOD OF PREPARING (3R,4S)-3-ACETAMIDO-4-ALLYL-N-(TERT-BUTYL)PYRROLIDINE-3-CARBOXAMIDE

A method is provided to conveniently separate racemic (3R,4S)-3-acetamido-4-allyl-N-(tert-butyl)pyrrolidine-3-carboxamide and (3S,4R)-3-acetamido-4-allyl-N-(tert-butyl)pyrrolidine-3-carboxamide using selective crystallization with chiral carboxylic acids.

METHOD OF PREPARING (3R,4S)-3-ACETAMIDO-4-ALLYL-N-(TERT-BUTYL)PYRROLIDINE-3-CARBOXAMIDE

A method is provided to conveniently separate racemic (3R,4S)-3-acetamido-4-allyl-N-(tert-butyl)pyrrolidine-3-carboxamide and (3S,4R)-3-acetamido-4-allyl-N-(tert-butyl)pyrrolidine-3-carboxamide using selective crystallization with chiral carboxylic acids.