The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

Provided is a fluorine-containing ether compound that can be suitably used as a material for a lubricant for a magnetic recording medium, capable of forming a lubricant layer having excellent chemical substance resistance and wear resistance even when the thickness is small. A fluorine-containing ether compound represented by the following formula (1):

R.sup.1—R.sup.2—CH.sub.2—R.sup.3—CH.sub.2—R.sup.4—R.sup.5  (1)

In the formula (1), R.sup.3 is a perfluoropolyether chain. R.sup.2 and R.sup.4 are divalent linkage groups having a polar group, and may be the same or different. R.sup.1 and R.sup.5 are terminal groups bonded to R.sup.2 or R.sup.4, which may be the same or different, and at least one of R.sup.1 and R.sup.5 is an organic group having 1 to 8 carbon atoms wherein one or more hydrogen atoms of the organic group is substituted with a cyano group.

Provided is a fluorine-containing ether compound that can be suitably used as a material for a lubricant for a magnetic recording medium, capable of forming a lubricant layer having excellent chemical substance resistance and wear resistance even when the thickness is small. A fluorine-containing ether compound represented by the following formula (1):

R.sup.1—R.sup.2—CH.sub.2—R.sup.3—CH.sub.2—R.sup.4—R.sup.5  (1)

In the formula (1), R.sup.3 is a perfluoropolyether chain. R.sup.2 and R.sup.4 are divalent linkage groups having a polar group, and may be the same or different. R.sup.1 and R.sup.5 are terminal groups bonded to R.sup.2 or R.sup.4, which may be the same or different, and at least one of R.sup.1 and R.sup.5 is an organic group having 1 to 8 carbon atoms wherein one or more hydrogen atoms of the organic group is substituted with a cyano group.

Object of the present invention is an efficient process for the preparation of the active pharmaceutical ingredient Sitagliptine and the 2,4,5-trifluorophenylacetic acid (TFAA) and salt thereof, which is a key intermediate for the synthesis of Sitagliptine.

##STR00001##

Object of the present invention is an efficient process for the preparation of the active pharmaceutical ingredient Sitagliptine and the 2,4,5-trifluorophenylacetic acid (TFAA) and salt thereof, which is a key intermediate for the synthesis of Sitagliptine.

##STR00001##

A pinene-derived diisocyanate compound, a process for forming a pinene-derived diisocyanate compound, and an article of manufacture containing a polyurethane polymer are disclosed. The process for forming the pinene-derived diisocyanate compound includes oxidizing the pinene to form a pinene-derived ketone compound, converting the pinene-derived ketone compound to a diamine compound in subsequent reaction steps, and reacting the diamine compound with phosgene to form the pinene-derived diisocyanate compound. The polyurethane polymer is synthesized in a reaction between a pinene-derived diisocyanate compound and a polyol.

A pinene-derived diisocyanate compound, a process for forming a pinene-derived diisocyanate compound, and an article of manufacture containing a polyurethane polymer are disclosed. The process for forming the pinene-derived diisocyanate compound includes oxidizing the pinene to form a pinene-derived ketone compound, converting the pinene-derived ketone compound to a diamine compound in subsequent reaction steps, and reacting the diamine compound with phosgene to form the pinene-derived diisocyanate compound. The polyurethane polymer is synthesized in a reaction between a pinene-derived diisocyanate compound and a polyol.

A pinene-derived diisocyanate compound, a process for forming a pinene-derived polyurethane, and an article of manufacture that includes the polyurethane are disclosed. The process for forming the polyurethane includes forming a pinene-derived diisocyanate compound, and reacting the pinene-derived diisocyanate compound with a polyol in a polymerization compound.

A pinene-derived diisocyanate compound, a process for forming a pinene-derived polyurethane, and an article of manufacture that includes the polyurethane are disclosed. The process for forming the polyurethane includes forming a pinene-derived diisocyanate compound, and reacting the pinene-derived diisocyanate compound with a polyol in a polymerization compound.