Patent classifications
C07C305/04
SOLID FORMS COMPRISING 4-AMINO-2-(2,6-DIOXOPIPERIDINE-3-YL)ISOINDOLINE-1,3-DIONE AND A COFORMER, COMPOSITIONS AND METHODS OF USE THEREOF
Provided herein are solid forms comprising (a) 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and (b) a coformer. Pharmaceutical compositions comprising the solid forms (e.g., cocrystals) and methods for treating, preventing and managing various disorders are also disclosed.
SOLID FORMS COMPRISING 4-AMINO-2-(2,6-DIOXOPIPERIDINE-3-YL)ISOINDOLINE-1,3-DIONE AND A COFORMER, COMPOSITIONS AND METHODS OF USE THEREOF
Provided herein are solid forms comprising (a) 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and (b) a coformer. Pharmaceutical compositions comprising the solid forms (e.g., cocrystals) and methods for treating, preventing and managing various disorders are also disclosed.
Solid forms comprising 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and a coformer, compositions and methods of use thereof
Provided herein are solid forms comprising (a) 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and (b) a coformer. Pharmaceutical compositions comprising the solid forms (e.g., cocrystals) and methods for treating, preventing and managing various disorders are also disclosed.
Solid forms comprising 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and a coformer, compositions and methods of use thereof
Provided herein are solid forms comprising (a) 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and (b) a coformer. Pharmaceutical compositions comprising the solid forms (e.g., cocrystals) and methods for treating, preventing and managing various disorders are also disclosed.
Novel Chlorhexidine Salts and Related Compositions and Methods
This application relates to a novel chlorhexidine lauryl sulfate salt, which provides enhanced chlorhexidine stability and enhanced anti-bacterial activity, and to formulations and methods utilizing the novel salt.
Novel Chlorhexidine Salts and Related Compositions and Methods
This application relates to a novel chlorhexidine lauryl sulfate salt, which provides enhanced chlorhexidine stability and enhanced anti-bacterial activity, and to formulations and methods utilizing the novel salt.
Alkyl sulfate ester or salt of same
An alkyl sulfate ester containing a carbonyl group or a salt thereof. The compound is represented by the following formula:
R.sup.1C(O)(CR.sup.2.sub.2).sub.n(OR.sup.3).sub.p(CR.sup.4.sub.2).sub.q-L-OSO.sub.3X
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, L, X, n, p and q are as defined herein. Also disclosed is a production method for making the alkyl sulfate ester.
Alkyl sulfate ester or salt of same
An alkyl sulfate ester containing a carbonyl group or a salt thereof. The compound is represented by the following formula:
R.sup.1C(O)(CR.sup.2.sub.2).sub.n(OR.sup.3).sub.p(CR.sup.4.sub.2).sub.q-L-OSO.sub.3X
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, L, X, n, p and q are as defined herein. Also disclosed is a production method for making the alkyl sulfate ester.
WATER-SOLUBLE DIACETYLENE, PHOTOLITHOGRAPHY COMPOSITION COMPRISING WATER-SOLUBLE DIACETYLENE MONOMER AND CONDUCTIVE POLYMER, AND FINE PATTERN PREPARATION METHOD USING SAME
Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.
WATER-SOLUBLE DIACETYLENE, PHOTOLITHOGRAPHY COMPOSITION COMPRISING WATER-SOLUBLE DIACETYLENE MONOMER AND CONDUCTIVE POLYMER, AND FINE PATTERN PREPARATION METHOD USING SAME
Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.