C07C311/49

Arylamide derivative having antitumor activity

The present disclosure provides, for example, a compound represented by the general formula below or a pharmaceutically acceptable salt thereof, or a pharmaceutically acceptable solvate of the compound or salt: ##STR00001##
wherein X.sub.1, X.sub.2, X.sub.3 and X.sub.4 are each independently CR.sub.2? or N?, R.sub.2 is, for example, a halogen atom, R.sub.1 is, for example, S(?O).sub.2NHR.sub.8, R.sub.8 is, for example, a C.sub.1-6 alkyl group, R.sub.3 is, for example, a hydrogen atom, R.sub.5 is, for example, a halogen atom, R.sub.6 is, for example, a hydrogen atom, and R.sub.4 is, for example, a cyclopropyl group. The compounds, salts or solvates provided by the present disclosure exhibit high RAF/MEK complex-stabilizing activity and can be used for the treatment or prevention of cell proliferative disorders, particularly cancers.

RATIONAL DRUG DESIGN TARGETING RESISTANT GRAM-NEGATIVE BACTERIAL INFECTIONS TO POLYMYXIN-CLASS ANTIBIOTICS

The present invention relates to identification of inhibitors or antagonists of aminoarabinase glycosyltransferase (ArnT) and their use in compositions, methods of treatment or prevention of drug resistant gram negative infections, or inhibiting the growth of gram negative bacterial infections resistant to polymyxin-class antibiotics. In certain aspects, the inhibitors or antagonists can be administered in combination with one or more antibacterial agents.

Cryopyrin inhibitors for preventing and treating inflammation

Inhibitors that are anti-inflammatory agents are provided, as are methods of using the analogs to inhibit inflammation and prevent or treat diseases and conditions associated with inflammation, such as heart failure and autoimmune diseases.

Cryopyrin inhibitors for preventing and treating inflammation

Inhibitors that are anti-inflammatory agents are provided, as are methods of using the analogs to inhibit inflammation and prevent or treat diseases and conditions associated with inflammation, such as heart failure and autoimmune diseases.

Fluoroallylsulfonyl azide monomers and polymers there from

This invention pertains to fluoroallylsulfonyl azide compounds of formula: CF.sub.2CFCF.sub.2R.sub.fSO.sub.2N.sub.3 formula (I) wherein R.sub.f is a divalent (per)fluorinated group, optionally comprising one or more than one ethereal oxygen atom [monomer (Az)], which are useful as functional monomers in fluoropolymers, to the fluoropolymers which comprise recurring units derived from such fluoroallylsulfonyl azide compounds, to a process for their manufacture, to a curable compound comprising the same and to a method for crosslinking the same.

Fluoroallylsulfonyl azide monomers and polymers there from

This invention pertains to fluoroallylsulfonyl azide compounds of formula: CF.sub.2CFCF.sub.2R.sub.fSO.sub.2N.sub.3 formula (I) wherein R.sub.f is a divalent (per)fluorinated group, optionally comprising one or more than one ethereal oxygen atom [monomer (Az)], which are useful as functional monomers in fluoropolymers, to the fluoropolymers which comprise recurring units derived from such fluoroallylsulfonyl azide compounds, to a process for their manufacture, to a curable compound comprising the same and to a method for crosslinking the same.

IDO INHIBITORS

There are disclosed compounds that modulate or inhibit the enzymatic activity of indoleamine 2,3-dioxygenase (IDO), pharmaceutical compositions containing said compounds and methods of treating proliferative disorders, such as cancer, viral infections and/or inflammatory disorders utilizing the compounds of the invention.

Monomer, polymer, resist composition, and patterning process
10054853 · 2018-08-21 · ·

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning. ##STR00001##

Monomer, polymer, resist composition, and patterning process
10054853 · 2018-08-21 · ·

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning. ##STR00001##

ARYL SULFONOHYDRAZIDES

Compound of formula I:

##STR00001##

wherein: A is selected from: (i)

##STR00002##

where R.sup.F1 is H or F; (ii)

##STR00003## (iii) a N-containing C.sub.6 heteroaryl group; and B is

##STR00004##

where X.sup.1 is either CR.sup.F2 or N, where R.sup.F2 is H or F; X.sup.2 is either CR.sup.3 or N, where R.sup.3 is selected from H, Me, Cl, F OMe; X.sup.3 is either CH or N; X.sup.4 is either CR.sup.F3 or N, where R.sup.F3 is H or F; where only one or two of X.sup.1, X.sup.2, X.sup.3 and X.sup.4 may be N; and R.sup.4 is selected from I, optionally substituted phenyl, optionally substituted C.sub.5-6 heteroaryl; optionally substituted C.sub.1-6 alkyl and optionally substituted C.sub.1-6 alkoxy, which are useful in the treatment of a condition ameliorated by the inhibition of MOZ.