The invention provides compounds having the general formula I:

##STR00001##

and pharmaceutically acceptable salts thereof, wherein the variables R.sup.AA, n, ring A, X.sup.1, L, m, X.sup.2, R.sup.2, R.sup.3, R.sup.4, R.sup.5, X, and R.sup.6 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

The invention provides compounds having the general formula I:

##STR00001##

and pharmaceutically acceptable salts thereof, wherein the variables R.sup.AA, n, ring A, X.sup.1, L, m, X.sup.2, R.sup.2, R.sup.3, R.sup.4, R.sup.5, X, and R.sup.6 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

The preparation and use of mixed salts of hydroxyalkane sulfinic acids and optionally hydroxyalkane sulfonic acids as a reducing agent are disclosed. The reducing power of the salts is significantly higher than the reducing power of the corresponding zinc salt. The storage stability of the salts as solids and as aqueous solution is significantly higher than one of the corresponding sodium salts.

The preparation and use of mixed salts of hydroxyalkane sulfinic acids and optionally hydroxyalkane sulfonic acids as a reducing agent are disclosed. The reducing power of the salts is significantly higher than the reducing power of the corresponding zinc salt. The storage stability of the salts as solids and as aqueous solution is significantly higher than one of the corresponding sodium salts.

The invention relates to a synergistically active composition which comprises a mixture of a sulfinic acid or a salt thereof and ascorbic acid or a salt thereof and the use of the composition as reducing agent. The reducing power of the composition of the invention is significantly higher than the reducing power of the single components.

A process for the preparation of a class of molecules, namely bicyclo[1.1.1]pentanes and derivatives thereof by reaction of [1.1.1]propellane with a variety of reagents under irradiation and/or in the presence of radical initiators to obtain bicyclo[1.1.1]pentanes asymmetrically substituted at position 1 and 3, which are useful as intermediates for the preparation of asymmetrically 1,3-disubstituted bicyclo[1.1.1]pentane derivatives and various physiologically active substances or materials containing these structures.

A process for the preparation of a class of molecules, namely bicyclo[1.1.1]pentanes and derivatives thereof by reaction of [1.1.1]propellane with a variety of reagents under irradiation and/or in the presence of radical initiators to obtain bicyclo[1.1.1]pentanes asymmetrically substituted at position 1 and 3, which are useful as intermediates for the preparation of asymmetrically 1,3-disubstituted bicyclo[1.1.1]pentane derivatives and various physiologically active substances or materials containing these structures.

New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (PAGs) are provided as well as photoresist compositions that comprise such PAG compounds.

New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (PAGs) are provided as well as photoresist compositions that comprise such PAG compounds.

Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.