A diphenylsulfone compound containing 4,4′-dihydroxydiphenylsulfone is produced in good yield in a short time and at a relatively low temperature. A diphenylsulfone compound represented by formula (2) below is produced by irradiating, with microwaves, a compound represented by formula (1) below and a sulfonating agent so that a dehydration condensation reaction is carried out.

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The invention features 4-((phenoxyalkyl)thio)-phenoxyacetic acids and analogs, compositions containing them, and methods of using them as PPAR delta modulators to treat or inhibit the progression of, for example, dyslipidemia.

The invention features 4-((phenoxyalkyl)thio)-phenoxyacetic acids and analogs, compositions containing them, and methods of using them as PPAR delta modulators to treat or inhibit the progression of, for example, dyslipidemia.

Novel fluorinated benzenesulfonamides compounds of general formula (I) ##STR00001##
can be used in biomedicine as active ingredients in pharmaceutical formulations, because they inhibit enzymes which participate in disease progression.

Novel fluorinated benzenesulfonamides compounds of general formula (I) ##STR00001##
can be used in biomedicine as active ingredients in pharmaceutical formulations, because they inhibit enzymes which participate in disease progression.

An organic film composition including a compound represented by the following general formula (1), ##STR00001## wherein n1 and n2 each independently represent 0 or 1; “W” represents a single bond or any of structures represented by the following formula (2); R.sub.1 represents any of structures represented by the following general formula (3); m1 and m2 each independently represent an integer of 0 to 7, with the proviso that m1+m2 is 1 to 14. ##STR00002##
There can be provided an organic film composition for forming an organic film having dry etching resistance as well as advanced filling/planarizing characteristics.

An organic film composition including a compound represented by the following general formula (1), ##STR00001## wherein n1 and n2 each independently represent 0 or 1; “W” represents a single bond or any of structures represented by the following formula (2); R.sub.1 represents any of structures represented by the following general formula (3); m1 and m2 each independently represent an integer of 0 to 7, with the proviso that m1+m2 is 1 to 14. ##STR00002##
There can be provided an organic film composition for forming an organic film having dry etching resistance as well as advanced filling/planarizing characteristics.

There is disclosed a salt of Formula III, a method for manufacturing thereof as well as uses thereof. (Formula III), wherein X is H or OH, Y is H or a cation selected from the group consisting of Li, Na and K, is a single bond or a double bond, and n is 0.5 or 1.

##STR00001##

There is disclosed a salt of Formula III, a method for manufacturing thereof as well as uses thereof. (Formula III), wherein X is H or OH, Y is H or a cation selected from the group consisting of Li, Na and K, is a single bond or a double bond, and n is 0.5 or 1.

##STR00001##

The present disclosure relates to HIF-2α inhibitors and methods of making and using them for treating cancer. Certain compounds were potent in HIF-2α scintillation proximity assay, luciferase assay, and VEGF ELISA assay, and led to tumor size reduction and regression in 786-O xenograft bearing mice in vivo.