Patent classifications
C07C321/26
SILYLATIONS OF AROMATIC SUBSTRATES WITH BASE-ACTIVATED ORGANOSILANES
The present disclosure describes methods for silylating aromatic organic substrates, and associated chemical systems, said methods comprising or consisting essentially of contacting the aromatic organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.
SILYLATIONS OF AROMATIC SUBSTRATES WITH BASE-ACTIVATED ORGANOSILANES
The present disclosure describes methods for silylating aromatic organic substrates, and associated chemical systems, said methods comprising or consisting essentially of contacting the aromatic organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.
PALLADIUM FREE PROCESSES FOR PREPARATION OF ACRYLATE COMPOUNDS
The present invention relates to precious metal (Pd/Pt/Rh/Ru) free, preferably Pd free, processes for preparing a compound having formula (1) wherein: R.sup.1, R.sup.2, and X are as defined in the specification, or a salt thereof. Preferably, the compound is an iodo acrylate compound.
##STR00001##
PALLADIUM FREE PROCESSES FOR PREPARATION OF ACRYLATE COMPOUNDS
The present invention relates to precious metal (Pd/Pt/Rh/Ru) free, preferably Pd free, processes for preparing a compound having formula (1) wherein: R.sup.1, R.sup.2, and X are as defined in the specification, or a salt thereof. Preferably, the compound is an iodo acrylate compound.
##STR00001##
NAPHTHALENEDITHIOL AND DERIVATIVE THEREOF, AND PRODUCTION PROCESS AND USE FOR THE SAME
Provided are a naphthalenedithiol or a derivative thereof that can achieve both high refractive index and high dissolubility (compatibility), and a process for producing the same and a use therefor. A naphthalene compound of the present invention is represented by the formula (1):
##STR00001## wherein R.sup.1 and R.sup.2 independently represent a hydrogen atom or a substituent, R.sup.3 represents a substituent, and n denotes an integer of 0 to 6.
At least one of R.sup.1 and R.sup.2 may represent the substituent. The naphthalene compound of the formula (1) may be dissolved in or mixed with an organic solvent to prepare a mixture (or blend); a curable composition containing the naphthalene compound of the formula (1) may be prepared; a resin of the present invention at least contains a constituent unit represented by the formula (1P):
##STR00002## wherein R.sup.3 represents a substituent, and n denotes an integer of 0 to 6.
SUBSTITUTED 3-HALOALLYLAMINE INHIBITORS OF SSAO AND USES THEREOF
The present invention is related to the preparation and pharmaceutical use of substituted 3-haloallylamine derivatives as SSAO/VAP-1 inhibitors having the structure of Formula I, as defined in the specification:
##STR00001##
The invention also relates to methods of using compounds of Formula I, or pharmaceutically acceptable salt or derivatives thereof, for the treatment of a variety of indications, e.g., inflammatory diseases, ocular diseases, fibrotic diseases, diabetes-induced diseases and cancer.
SUBSTITUTED 3-HALOALLYLAMINE INHIBITORS OF SSAO AND USES THEREOF
The present invention is related to the preparation and pharmaceutical use of substituted 3-haloallylamine derivatives as SSAO/VAP-1 inhibitors having the structure of Formula I, as defined in the specification:
##STR00001##
The invention also relates to methods of using compounds of Formula I, or pharmaceutically acceptable salt or derivatives thereof, for the treatment of a variety of indications, e.g., inflammatory diseases, ocular diseases, fibrotic diseases, diabetes-induced diseases and cancer.
Reactions of aromatic substrates with base-activated hydrosilanes-silylations and reductive cleavage
The present invention describes chemical systems and methods for reducing CO, CN, and CS bonds, said system comprising a mixture of (a) at least one organosilane and (b) at least one strong base, said system being substantially free of a transition-metal compound, and said system optionally comprising at least one molecular hydrogen donor compound, molecular hydrogen, or both.
Reactions of aromatic substrates with base-activated hydrosilanes-silylations and reductive cleavage
The present invention describes chemical systems and methods for reducing CO, CN, and CS bonds, said system comprising a mixture of (a) at least one organosilane and (b) at least one strong base, said system being substantially free of a transition-metal compound, and said system optionally comprising at least one molecular hydrogen donor compound, molecular hydrogen, or both.
Additive for imparting ultraviolet absorbency and/or high refractive index to matrix, and resin member using same
Provided is an additive for imparting ultraviolet absorbency, or an additive for imparting a high refractive index, which has satisfactory compatibility with a resin serving as a matrix and can maintain high transparency even if added in high concentrations. Also provided is an additive with which the function of imparting both ultraviolet absorbency and a high refractive index can be realized by means of one kind of additive. This additive is represented by the following Formula (I): ##STR00001## wherein at least one of R.sup.1a to R.sup.9a is a monovalent sulfur-containing group represented by the following Formula (i-1) or Formula (i-2): ##STR00002## wherein R.sup.10a to R.sup.12a each represent a divalent hydrocarbon group or the like; and R.sup.13a represents a monovalent hydrocarbon group or the like.