Provided is an additive for imparting ultraviolet absorbency, or an additive for imparting a high refractive index, which has satisfactory compatibility with a resin serving as a matrix and can maintain high transparency even if added in high concentrations. Also provided is an additive with which the function of imparting both ultraviolet absorbency and a high refractive index can be realized by means of one kind of additive. This additive is represented by the following Formula (I): ##STR00001## wherein at least one of R.sup.1a to R.sup.9a is a monovalent sulfur-containing group represented by the following Formula (i-1) or Formula (i-2): ##STR00002## wherein R.sup.10a to R.sup.12a each represent a divalent hydrocarbon group or the like; and R.sup.13a represents a monovalent hydrocarbon group or the like.

Provided is an additive for imparting ultraviolet absorbency, or an additive for imparting a high refractive index, which has satisfactory compatibility with a resin serving as a matrix and can maintain high transparency even if added in high concentrations. Also provided is an additive with which the function of imparting both ultraviolet absorbency and a high refractive index can be realized by means of one kind of additive. This additive is represented by the following Formula (I): ##STR00001## wherein at least one of R.sup.1a to R.sup.9a is a monovalent sulfur-containing group represented by the following Formula (i-1) or Formula (i-2): ##STR00002## wherein R.sup.10a to R.sup.12a each represent a divalent hydrocarbon group or the like; and R.sup.13a represents a monovalent hydrocarbon group or the like.

The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): ##STR00001##
wherein, each R.sup.0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): ##STR00001##
wherein, each R.sup.0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

A novel compound for a capping layer, and an organic light-emitting device containing the same are disclosed.

A novel compound for a capping layer, and an organic light-emitting device containing the same are disclosed.

Provided are a naphthalenedithiol (or a naphthalenedithiol product) having a high purity and a reduced coloration, and a process for producing the same.

A 1,6-naphthalenedithiol (a 1,6-naphthalenedithiol product) according to the present invention has a purity of not less than 99.5% and a polymeric 1,6-naphthalenedithiol content of not more than 0.2%, each determined by high performance liquid chromatography using area normalization; and has a Gardner color scale in a molten state of not more than 1. The polymeric 1,6-naphthalenedithiol may be a disulfide form as a dimeric 1,6-naphthalenedithiol. Such a 1,6-naphthalenedithiol product can be produced by distilling a crude raw material containing 1,6-naphthalenedithiol and at least a polymeric 1,6-naphthalenedithiol to obtain a distillate fraction containing 1,6-naphthalenedithiol. The crude raw material may be a dry solid of a crudely purified product of 1,6-naphthalenedithiol from a reaction mixture.

Provided are a naphthalenedithiol (or a naphthalenedithiol product) having a high purity and a reduced coloration, and a process for producing the same.

A 1,6-naphthalenedithiol (a 1,6-naphthalenedithiol product) according to the present invention has a purity of not less than 99.5% and a polymeric 1,6-naphthalenedithiol content of not more than 0.2%, each determined by high performance liquid chromatography using area normalization; and has a Gardner color scale in a molten state of not more than 1. The polymeric 1,6-naphthalenedithiol may be a disulfide form as a dimeric 1,6-naphthalenedithiol. Such a 1,6-naphthalenedithiol product can be produced by distilling a crude raw material containing 1,6-naphthalenedithiol and at least a polymeric 1,6-naphthalenedithiol to obtain a distillate fraction containing 1,6-naphthalenedithiol. The crude raw material may be a dry solid of a crudely purified product of 1,6-naphthalenedithiol from a reaction mixture.

The present invention is related to the preparation and pharmaceutical use of substituted 3-haloallylamine derivatives as SSAO/VAP-1 inhibitors having the structure of Formula I, as defined in the specification:

##STR00001##

The invention also relates to methods of using compounds of Formula I, or pharmaceutically acceptable salt or derivatives thereof, for the treatment of a variety of indications, e.g., inflammatory diseases, ocular diseases, fibrotic diseases, diabetes-induced diseases and cancer.

The present invention is related to the preparation and pharmaceutical use of substituted 3-haloallylamine derivatives as SSAO/VAP-1 inhibitors having the structure of Formula I, as defined in the specification:

##STR00001##

The invention also relates to methods of using compounds of Formula I, or pharmaceutically acceptable salt or derivatives thereof, for the treatment of a variety of indications, e.g., inflammatory diseases, ocular diseases, fibrotic diseases, diabetes-induced diseases and cancer.