The invention provides compounds having the general formula I: ##STR00001## and pharmaceutically acceptable salts thereof, wherein the variables R.sup.AA, n, ring A, X.sup.1, L, m, X.sup.2, R.sup.2, R.sup.3, R.sup.4, R.sup.5, X, and R.sup.6 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

Carbon monoxide-releasing organic molecules are described herein. The molecules can be synthesized prior to administration (e.g., ex vivo) or formed in vivo. In those embodiments where the molecules are formed in vivo, reactants are administered under physiological conditions and undergo a cycloaddition reaction to form a product which releases carbon monoxide. In applying such reactions for therapeutic applications in vivo, the cycloaddition and CO release typically occur only under near-physiological or physiological conditions. For example, in some embodiments, the cycloaddition reaction and/or release of carbon monoxide occur at a temperature of about 37° C. and pH of about 7.4. Pharmaceutical compositions and methods for release carbon monoxide are also described.

Pleuromutilin derivative compounds of the following formula (I), and uses thereof for the treatment of diseases mediated by microbes, are disclosed

##STR00001##

Pleuromutilin derivative compounds of the following formula (I), and uses thereof for the treatment of diseases mediated by microbes, are disclosed

##STR00001##

A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.

The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.

The present invention provides compounds of formula (I): ##STR00001##
or a pharmaceutically acceptable salt, solvate, or prodrug thereof, wherein W, X, n, s, t, and R.sup.a are as described herein. The present invention relates generally to selective inhibitors of histone deacetylase and to methods of making and using them.

The present invention provides compounds of formula (I): ##STR00001##
or a pharmaceutically acceptable salt, solvate, or prodrug thereof, wherein W, X, n, s, t, and R.sup.a are as described herein. The present invention relates generally to selective inhibitors of histone deacetylase and to methods of making and using them.

Pleuromutilin derivative compounds of the following formula (I), and uses thereof for the treatment of diseases mediated by microbes, are disclosed:

##STR00001##