This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R.sub.1, R.sub.2, R.sub.3, R.sub.5 and R.sub.6 represent a hydroxy group or an alkoxy group; the R.sub.4's independently represent an organic group containing a thioether bond; R.sub.7 and R.sub.9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R.sub.8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion. ##STR00001##

The present invention relates to novel ophthalmic devices comprising polymerized compounds comprising a photoactive unit, said polymerized compounds, and special monomer compounds being particularly suitable for compositions and ophthalmic devices.

The present invention relates to novel ophthalmic devices comprising polymerized compounds comprising a photoactive unit, said polymerized compounds, and special monomer compounds being particularly suitable for compositions and ophthalmic devices.

The present invention provides a compound, a composition, a cured object, an optically anisotropic body, and a reflective film which have high refractive index anisotropy Δn and excellent light resistance, and which exhibit liquid crystallinity. The compound of the present invention is a compound represented by General Formula (1). ##STR00001##

The present invention provides a compound, a composition, a cured object, an optically anisotropic body, and a reflective film which have high refractive index anisotropy Δn and excellent light resistance, and which exhibit liquid crystallinity. The compound of the present invention is a compound represented by General Formula (1). ##STR00001##

Substituted aromatic sulfonamides of formula (I)

##STR00001##

pharmaceutical compositions and combinations comprising said compounds and the use of said compounds for manufacturing a pharmaceutical composition for the treatment or prophylaxis of a disease.

Substituted aromatic sulfonamides of formula (I)

##STR00001##

pharmaceutical compositions and combinations comprising said compounds and the use of said compounds for manufacturing a pharmaceutical composition for the treatment or prophylaxis of a disease.

Provided herein are compounds and pharmaceutical compositions comprising said compounds that are useful for treating cancers. Specific cancers include those that are mediated by YAP/TAZ or those that are modulated by the interaction between YAP/TAZ and TEAD.

Compounds and methods for use to treat a bacterial infection caused by, for example, gram positive bacteria, gram negative bacteria, and/or mycobacteria are provided herein. Also provided herein are compounds and methods for use in potentiating the effect of an antibiotic in the treatment of a bacterial infection. Pharmaceutical compositions including the compounds as described herein are also provided.

The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.