Provided is a compound according to Formula 1

##STR00001##

wherein X, R, R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are as defined herein. The compound of Formula 1 can be useful in a composition and in a method for inducing ferroptosis in a cell.

An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a specific compound, in which the specific compound has two or more cationic moieties and the same number of anionic moieties as that of the cationic moieties, and at least one of the cationic moieties has a group represented by General Formula (I).

A TRPM8 antagonist is provided that comprises the following the formula (I) described herein. In the formula (I), R.sub.1 is selected from a cycloalkyl, a bicycloalkyl, or a tricycloalkyl group. Each R.sub.1 group has 5 to 12 carbon atoms. Further, each R.sub.1 group is optionally substituted with an alkyl group having 1 to 5 carbons atoms or with a cycloalkyl group having 4 to 12 carbon atoms, and each R.sub.1 group is optionally saturated or partially unsaturated. Methods for treating pain are further provided and comprise administering to a subject in need thereof an effective amount of a TRPM8 antagonist comprising the formula (I).

A light emitting device includes a first electrode, a second electrode on the first electrode, and at least one functional layer between the first electrode and the second electrode and including an amine compound represented by Formula 1.

##STR00001##

A salt having formula (1) or (2) serving as an acid diffusion inhibitor is provided as well as a resist composition comprising the acid diffusion inhibitor. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography properties such as CDU and LWR.

##STR00001##

The disclosure relates to dicarbonyl complexes of ruthenium and osmium with bi- and tridentate nitrogen and phosphine ligands. The disclosure relates to methods for preparing these complexes and the use of these complexes, isolated or prepared in situ, as catalysts for reduction reactions of ketones and aldehydes both via transfer hydrogenation or hydrogenation with hydrogen.

The present invention generally relates to carbon monoxide releasing compounds and compositions, and their use as carbon monoxide prodrugs.

Provided are a tricyclodecane dimethanol composition which may be suitably used in preparing a polyester resin exhibiting excellent solvent resistance and chemical resistance when forming a coating film and having excellent solubility in organic solvents or water, and a preparation method thereof.

Provided are an amine compound represented by Formula 1, a light-emitting device including the same, and an electronic apparatus including the light-emitting device. The light-emitting device includes: a first electrode; a second electrode facing the second electrode; an interlayer between the first electrode and the second electrode and including an emission layer; and at least one of the amine compound represented by Formula 1.

##STR00001##

The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.