Disclosed herein, inter alia, are inhibitors of integrin alpha 2 beta 1 and methods of using the same.

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

##STR00001##

Provided are monomers useful for dental materials that include a compound in which a core and a specific terminal group are bonded to each other directly or via a linking group, wherein the core is a C.sub.1-200 polyvalent organic group having a valence of not less than 3 containing an oxygen atom or a nitrogen atom in which an atom bonded to the terminal group or the linking group is the oxygen atom or the nitrogen atom; the terminal group is a specific (meth)acryloyl group-containing group, a (meth)acryloyl group, a C.sub.1-20 hydrocarbon group or a hydrogen atom, and the terminal group needs to meet specific requirements; and the linking group is a specific divalent group, and when the compound contains a plurality of linking groups, the linking groups may be the same as or different from each other. Compositions, dental materials and kits are also provided.

A resist composition containing a polymeric compound having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1). In the formula, represents a polymerizable group-containing group, Ra.sup.01 represents a linear or branched hydrocarbon group, and Ra.sup.02 and Ra.sup.03 each independently represents a hydrocarbon group which may have a substituent

##STR00001##

Provided are a novel amine composition and a novel amine compound. Also provided are a method for producing the amine composition and amine compound, and an epoxy resin curing agent, an epoxy resin composition, a cured product, a urethane prepolymer curing agent, a polyurethane urea resin composition, a polyamide varnish, and a polyamide, each obtained using the amine composition and amine compound. The amine composition contains a compound represented by Formula (1), wherein A is a cyclic alkylene group, and B is a group containing an aryl group or a heteroaryl group.

##STR00001##

Aromatic amides are described, having general formula (I): ##STR00001##
suitably substituted and having a high fungicidal activity, together with their use for controlling phytopathogenic fungi of important agricultural crops.

A metal-containing onium salt compound suitable for use as a photodegradable base of a resist composition and a resist composition using the metal-containing onium salt compound are provided, the resist composition having excellent sensitivity to ionizing radiation such as extreme ultraviolet (EUV), excellent resolution and focal depth in lithography, and can reduce line width roughness (LWR) in a fine pattern. The onium salt compound including a specific metal is used as the photodegradable base.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

Disclosed herein are methods, processes and compositions for preparing a compound of formula 8: (8), and formula 18: (18). The methods and processes comprise performing a first allylic oxidation, a protection reaction, a second allylic oxidation, a reduction reaction, performing an acid-catalyzed coupling reaction, a methylation reaction and a deprotection reaction. Disclosed herein are methods, processes and compositions for enantioselectively preparing compounds of formulae 8 and 18. Also disclosed herein are compositions comprising compounds of formulae 8, 18 and/or intermediates and/or starting material thereof.

##STR00001##

Compounds represented by formulae I, II, III, and IV including pro-drugs for treprostinil and prostacyclin analogs. Uses include treatment of pulmonary hypertension (PH) or pulmonary arterial hypertension (PAH). The structures of the compounds can be adapted to the particular application for a suitable treatment dosage. Transdermal applications can be used.