Patent classifications
C07D237/04
PYRROLIDINE AMIDE COMPOUNDS AS HISTONE DEMETHYLASE INHIBITORS
The present invention relates to compounds useful as inhibitors of one or more histone demethylses, such as KDM5. The invention also provides pharmaceutically acceptable compositions comprising compounds of the present invention and methods of using said compositions in the treatment of various disorders.
PYRROLIDINE AMIDE COMPOUNDS AS HISTONE DEMETHYLASE INHIBITORS
The present invention relates to compounds useful as inhibitors of one or more histone demethylses, such as KDM5. The invention also provides pharmaceutically acceptable compositions comprising compounds of the present invention and methods of using said compositions in the treatment of various disorders.
INHIBITORS OF HISTONE DEACETYLASE
The present invention relates to compounds of formula (I):
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or a pharmaceutically acceptable salt, hydrate, solvate, or prodrug thereof, wherein U, J, V, X, R.sup.1a, R.sup.2b, R.sup.2c, R.sup.5 and t are as described herein. The present invention relates generally to inhibitors of histone deacetylase and to methods of making and using them. These compounds are useful for promoting cognitive function and enhancing learning and memory formation. In addition, these compounds are useful for treating, alleviating, and/or preventing various conditions, including for example, neurological disorders, memory and cognitive function disorders/impairments, extinction learning disorders, fungal diseases and infections, inflammatory diseases, hematological diseases, and neoplastic diseases in humans and animals.
Photoresist composition, compound, and production method thereof
A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R.sup.1, R.sup.2, R.sup.3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NR.sup.a—. R.sup.a represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A.sup.− represents —SO.sub.3.sup.− or —CO.sub.2.sup.−. M.sup.+ represents a monovalent onium cation. ##STR00001##
Photoresist composition, compound, and production method thereof
A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R.sup.1, R.sup.2, R.sup.3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NR.sup.a—. R.sup.a represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A.sup.− represents —SO.sub.3.sup.− or —CO.sub.2.sup.−. M.sup.+ represents a monovalent onium cation. ##STR00001##
Small molecules against cereblon to enhance effector t cell function
Disclosed are small molecules against cereblon to enhance effector T cell function. Methods of making these molecules and methods of using them to treat various disease states are also disclosed.
Dihydropyridazine antioxidant sunscreens
Herein polymers and particles which comprise a plurality of dihydropyridazine or hydropyridazine functional groups are described. Methods for their formation and specific monomers which may be used in their formation are also described. The polymers and particles are UV absorbing, hydrogen-donor antioxidant materials which signal a depletion of antioxidant ability by a decrease in visible fluorescence. These polymers and particles may be used as UV protectants for a variety of materials and substrates and may even be used in a topically applied formulation for human skin.
REAGENT COMPOSITION FOR DETECTING ILLICIT DRUGS AND SHEET KIT FOR DETECTING ILLICIT DRUGS COMPRISING SAME
The present disclosure provides a reagent composition for detecting illicit drugs, the composition comprising: a diacetylene derivative compound represented by chemical formula 1; and at least one compound selected from among gabazine (SR-95531), an amine group-linked diacetylene derivative represented by chemical formula 2-1, and a gabazine-linked diacetylene derivative represented by chemical formula 2-2.
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##STR00003##
REAGENT COMPOSITION FOR DETECTING ILLICIT DRUGS AND SHEET KIT FOR DETECTING ILLICIT DRUGS COMPRISING SAME
The present disclosure provides a reagent composition for detecting illicit drugs, the composition comprising: a diacetylene derivative compound represented by chemical formula 1; and at least one compound selected from among gabazine (SR-95531), an amine group-linked diacetylene derivative represented by chemical formula 2-1, and a gabazine-linked diacetylene derivative represented by chemical formula 2-2.
##STR00001##
##STR00002##
##STR00003##
Process for the preparation of high purity Levosimendan
An improved process for the preparation of high purity Levosimendan includes treatment of Levosimendan crude with an organic acid, adding an organic acid to precipitate Levosimendan and isolating pure Levosimendan from the precipitate. Levosimendan obtained by the improved process is pharmaceutically acceptable with no impurity higher than 0.2 percent.