The present invention includes methods/processes and intermediates for preparing compounds having structural Formula (XI): ##STR00001##
wherein Y is C.sub.1-C.sub.12 alkylene or C.sub.1-C.sub.12 alkenylene; and R.sup.8 and R.sup.12 are independently C.sub.1-C.sub.12 alkyl.

Irreversible inhibitors of G12C mutant K-Ras protein are provided. Also disclosed are methods to modulate the activity of G12C mutant K-Ras protein and methods of treatment of disorders mediated by G12C mutant K-Ras protein.

Irreversible inhibitors of G12C mutant K-Ras protein are provided. Also disclosed are methods to modulate the activity of G12C mutant K-Ras protein and methods of treatment of disorders mediated by G12C mutant K-Ras protein.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.510.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.510.sup.7.Math.cm.sup.2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

A resist composition which generates an acid upon exposure, and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including a base material component whose solubility in the developing solution is changed due to the action of the acid, and an acid generator component which generates the acid upon exposure, in which the acid generator component contains two kinds of compounds.

Compounds active on protein kinases are described, as well as methods of using such compounds to treat diseases and conditions associated with aberrant activity of protein kinases.

Compounds active on protein kinases are described, as well as methods of using such compounds to treat diseases and conditions associated with aberrant activity of protein kinases.

The present invention includes methods/processes and intermediates for preparing compounds having structural Formula (XI):

##STR00001## wherein Y is C.sub.1-C.sub.12 alkylene or C.sub.1-C.sub.12 alkenylene; and R.sup.8 and R.sup.12 are independently C.sub.1-C.sub.12 alkyl.

The present invention includes methods/processes and intermediates for preparing compounds having structural Formula (XI):

##STR00001## wherein Y is C.sub.1-C.sub.12 alkylene or C.sub.1-C.sub.12 alkenylene; and R.sup.8 and R.sup.12 are independently C.sub.1-C.sub.12 alkyl.