A hybrid supercapacitor, including at least one negative electrode that includes a statically capacitive active material, an electrochemical redox active material, or a mixture thereof, at least one positive electrode that includes a statically capacitive active material, an electrochemical redox active material, or a mixture thereof, at least one separator that is situated between the at least one negative electrode and the at least one positive electrode, and an electrolyte composition, with the condition that at least one electrode includes a statically capacitive active material, and at least one electrode includes an electrochemical redox active material, the electrolyte composition being a liquid electrolyte composition and including at least one liquid, aprotic, organic solvent, at least one conducting salt, and at least one additive.

A hybrid supercapacitor, including at least one negative electrode that includes a statically capacitive active material, an electrochemical redox active material, or a mixture thereof, at least one positive electrode that includes a statically capacitive active material, an electrochemical redox active material, or a mixture thereof, at least one separator that is situated between the at least one negative electrode and the at least one positive electrode, and an electrolyte composition, with the condition that at least one electrode includes a statically capacitive active material, and at least one electrode includes an electrochemical redox active material, the electrolyte composition being a liquid electrolyte composition and including at least one liquid, aprotic, organic solvent, at least one conducting salt, and at least one additive.

Processes for producing a N,N-dialkyl perfluoroalkyl-sulfonamide product of the formula R.sub.f—S(O).sub.2—NR.sub.aR.sub.b (I) in which R.sub.f represents fully or partially fluorinated alkyl groups with carbon 1 to 12 and R.sub.a and R.sub.b represents linear or branched or cyclic alkyl, alkene or alkyne groups with carbon 1 to 12, wherein R.sub.a=R.sub.b or R.sub.a≠R.sub.b. In some embodiments, a reaction proceeds by contacting a perfluoroalkylsulfonyl halide of the formula: X—S(O).sub.2—R.sub.f, (II), in which X represents F, Cl, Br or I, with dialkylamine of the formula HNR.sub.aR.sub.b, under conditions sufficient to produce the desired N,N-dialkyl perfluoroalkylsulfonamide product of Formula I. In some embodiments, the reaction is carried out using a solvent of Formula I.

An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition by which a pattern having excellent LWR performance can be formed. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.

The actinic ray-sensitive or radiation-sensitive resin composition according to an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including an acid-decomposable resin including a repeating unit having an acid-decomposable group in which an acid group having a pKa of 13 or less is protected by a leaving group that leaves by an action of an acid, and one or more compounds that generate an acid upon irradiation with actinic rays or radiation, which are selected from a compound (I) and a compound (II),

in which the content of the acid-decomposable resin is 10% by mass or more with respect to a total solid content of the composition,

the content of the compounds that generate an acid upon irradiation with actinic rays or radiation is 10% by mass or more with respect to the total solid content of the composition, and

the acid-decomposable resin has a halogen atom in a repeating unit other than the repeating unit having a group that generates an acid upon irradiation with actinic rays or radiation.

This disclosure relates to a novel class of compounds having the structure of formula I as defined herein and pharmaceutical compositions comprising a compound of formula I or a pharmaceutically acceptable salt thereof. This disclosure also comprises methods of treating a subject by administering a therapeutically effective amount of a compound of formula I or a pharmaceutically acceptable salt thereof to the subject. These compounds are useful for the conditions disclosed herein. This disclosure further comprises methods for making the compounds of formula I and corresponding intermediates.

This disclosure relates to a novel class of compounds having the structure of formula I as defined herein and pharmaceutical compositions comprising a compound of formula I or a pharmaceutically acceptable salt thereof. This disclosure also comprises methods of treating a subject by administering a therapeutically effective amount of a compound of formula I or a pharmaceutically acceptable salt thereof to the subject. These compounds are useful for the conditions disclosed herein. This disclosure further comprises methods for making the compounds of formula I and corresponding intermediates.

Provided is a compound of Formula (I):

##STR00001## wherein the variable groups are defined herein.

Chemical agents, such as disulfonamide derivatives of fluorene, anthracene, xanthene, dibenzosuberone and acridine, and similar heterocyclic ring structures; including, salts thereof that act as anti-cancer and anti-tumor agents, along with methods for preparing such agents, as well as pharmaceutical compositions containing such agents as active ingredients and methods of using these as therapeutic agents.

Thionyl tetrafluoride gas reacts efficiently with primary amines to form reactive iminosulfur oxydifluoride compounds. These dual S.sup.VI—F loaded iminosulfur oxydifluoride compounds, in turn, readily react with secondary amines or aryloxy silyl ethers (ArO—SiR.sub.3), yielding the corresponding fused heteroatom-linked substrates. Iminosulfur oxyfluoride polymers also are provided by disclosed methods.

Thionyl tetrafluoride gas reacts efficiently with primary amines to form reactive iminosulfur oxydifluoride compounds. These dual S.sup.VI—F loaded iminosulfur oxydifluoride compounds, in turn, readily react with secondary amines or aryloxy silyl ethers (ArO—SiR.sub.3), yielding the corresponding fused heteroatom-linked substrates. Iminosulfur oxyfluoride polymers also are provided by disclosed methods.