A compound represented by the general Formula (I) below, or a salt or solvate thereof, which is useful as an ALK inhibitor, and is useful for prophylaxis or treatment of a disease accompanied by abnormality in ALK, for example, cancer, cancer metastasis, depression or cognitive function disorder:

##STR00001## (meanings of the symbols that are included in the formula are as given in the specification).

Compounds of the formula 1 ##STR00001##
wherein, R is hydrogen, alkyl or substituted alkyl, aryl or substituted aryl, are useful intermediates in the synthesis of fragrance ingredients such as Ambrox 2 ##STR00002##

Compounds of the formula 1 ##STR00001##
wherein, R is hydrogen, alkyl or substituted alkyl, aryl or substituted aryl, are useful intermediates in the synthesis of fragrance ingredients such as Ambrox 2 ##STR00002##

A novel organic compound having high stability is provided. The organic compound is represented by Formula (1) described in claim 1: In Formula (1), R.sub.1 and R.sub.2 each independently selected from a hydrogen atom, Substituent group A, and Substituent group B shown in claim 1, wherein at least one of R.sub.1 and R.sub.2 is selected from Substituent group A or Substituent group B; and R.sub.11 and R.sub.12 of a substituent belonging to Substituent group A are each independently selected from Substituent group B.

A novel organic compound having high stability is provided. The organic compound is represented by Formula (1) described in claim 1: In Formula (1), R.sub.1 and R.sub.2 each independently selected from a hydrogen atom, Substituent group A, and Substituent group B shown in claim 1, wherein at least one of R.sub.1 and R.sub.2 is selected from Substituent group A or Substituent group B; and R.sub.11 and R.sub.12 of a substituent belonging to Substituent group A are each independently selected from Substituent group B.

The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). ##STR00001##
(in formula (1), each X independently represents an oxygen atom or a sulfur atom, R.sup.1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R.sup.2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.).

The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). ##STR00001##
(in formula (1), each X independently represents an oxygen atom or a sulfur atom, R.sup.1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R.sup.2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.).

There are provided a compound containing a phenolic hydroxyl group which exhibits excellent heat resistance and excellent flame retardancy in terms of a cured product, a phenolic resin including the same, a curable composition and a cured product thereof, and a semiconductor sealing material. The compound containing a phenolic hydroxyl group has a dinaphthofuran skeleton, in which each of the two naphthylene skeletons has a hydroxyl group on an aromatic nucleus thereof.

There are provided a compound containing a phenolic hydroxyl group which exhibits excellent heat resistance and excellent flame retardancy in terms of a cured product, a phenolic resin including the same, a curable composition and a cured product thereof, and a semiconductor sealing material. The compound containing a phenolic hydroxyl group has a dinaphthofuran skeleton, in which each of the two naphthylene skeletons has a hydroxyl group on an aromatic nucleus thereof.

A compound of Chemical Formula 1:

##STR00001##

and an organic light emitting device including the same.