Methods, systems, and apparatus for monitoring and controlling electronic devices using wired and wireless protocols are disclosed. The systems and apparatus may monitor their environment for signals from electronic devices. The systems and apparatus may take and disambiguate the signals that are received from the devices in their environment to identify the devices and associate control signals with the devices. The systems and apparatus may use communication means to send control signals to the identified electronic devices. Multiple apparatuses or systems may be connected together into networks, including mesh networks, to make for a more robust architecture.

A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and not containing a repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W.sub.1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W.sub.2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M.sup.+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source. ##STR00001##

A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and not containing a repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W.sub.1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W.sub.2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M.sup.+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source. ##STR00001##

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.0 represents *—CO—O—, *—O—CO—, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; X.sup.1 represents an oxygen atom or a sulfur atom; R.sup.1 represents a halogen atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.0 represents *—CO—O—, *—O—CO—, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; X.sup.1 represents an oxygen atom or a sulfur atom; R.sup.1 represents a halogen atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.1 and X.sup.2 each represent *—CO—O—, *—O—CO—, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; A.sup.1 represents a group having a lactone structure which may have a substituent; L.sup.2 and L.sup.3 each represent a single bond or an alkanediyl group; R.sup.1 represents an iodine atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.1 and X.sup.2 each represent *—CO—O—, *—O—CO—, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; A.sup.1 represents a group having a lactone structure which may have a substituent; L.sup.2 and L.sup.3 each represent a single bond or an alkanediyl group; R.sup.1 represents an iodine atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.

A composition for an organic optoelectronic device, an organic optoelectronic device including the same, and a display device, the composition including a first compound represented by Chemical Formula 1, and a second compound represented by Chemical Formula 2,

##STR00001##

A composition for an organic optoelectronic device, an organic optoelectronic device including the same, and a display device, the composition including a first compound represented by Chemical Formula 1, and a second compound represented by Chemical Formula 2,

##STR00001##

A 5.sub.A5.sub.B6.sub.C tricyclic spironolactone derivative is provided with a formula XI: ##STR00001## The present invention also relates to its preparation method and its applications in the areas of insecticide, nematicide, fungicide and anti-viral agent. The 5.sub.A5.sub.B6.sub.C tricyclic spironolactone derivatives in the present invention are high-performance, broad-spectrum, low-toxicity and low-ecological risk compounds with a wide range of applications in the areas of agriculture, horticulture, forestry and health.