A salt represented by formula (I):

##STR00001##

wherein R.sup.1 and R.sup.2 each independently represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10 or —O-L.sup.1-CO—O—R.sup.10; L.sup.1 represents an alkanediyl group having 1 to 6 carbon atoms; R.sup.4, R.sup.5, R.sup.7 and R.sup.8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO.sub.2—; R.sup.10 represents an acid-labile group; X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI.sup.− represents an organic anion.

A class of compounds useful in pharmaceutical compositions and methods for treating or preventing cancer is described. Analogs of Mycalolide B have been prepared and tested in breast and ovarian cancer cell lines. The compounds show utility for inhibition of survival and proliferation of tumor cells. The compounds have been shown to disrupt actin.

Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: ##STR00001## wherein R.sup.1 represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R.sup.2, R.sup.3 and R.sup.4 each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X.sup.0 represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO.sub.2—.

Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: ##STR00001## wherein R.sup.1 represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R.sup.2, R.sup.3 and R.sup.4 each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X.sup.0 represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO.sub.2—.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group which may have a substituent, —CH.sub.2— included in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ≤ m1 + m7 ≤ 5, 0 ≤ m2 + m8 ≤ 4, 0 ≤ m3 + m9 ≤ 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X.sup.7 represents a single bond, —CH.sub.2—, —O—, —S—, etc., and Al— represents an organic anion.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group which may have a substituent, —CH.sub.2— included in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ≤ m1 + m7 ≤ 5, 0 ≤ m2 + m8 ≤ 4, 0 ≤ m3 + m9 ≤ 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X.sup.7 represents a single bond, —CH.sub.2—, —O—, —S—, etc., and Al— represents an organic anion.

The invention refers to a modular continuous flow device for automated chemical multistep synthesis under continuous flow conditions. The device comprises a plurality of different types of continuous flow modules and a valve assembly for connecting the continuous flow modules to each other in a parallel or radial manner. This arrangement allows conducting chemical reaction sequences by pre-synthesizing and intermediately storing or simultaneously synthesizing at least one intermediate product which is needed in the main synthetic reaction sequence in order to obtain the final product.

The invention refers to a modular continuous flow device for automated chemical multistep synthesis under continuous flow conditions. The device comprises a plurality of different types of continuous flow modules and a valve assembly for connecting the continuous flow modules to each other in a parallel or radial manner. This arrangement allows conducting chemical reaction sequences by pre-synthesizing and intermediately storing or simultaneously synthesizing at least one intermediate product which is needed in the main synthetic reaction sequence in order to obtain the final product.

An object of the present invention is to provide a compound having an excellent rate of change in HTP caused by exposure. Another object of the present invention is to provide a liquid crystal composition formed of the compound, a cured product, an optically anisotropic body, and a reflective film.

The compound of the present invention is represented by General Formula (1).

##STR00001##

In General Formula (1), a portion where a solid line and a broken line are parallel to each other represents a single bond or a double bond.

In General Formula (1), X.sup.1 to X.sup.8 each independently represent a hydrogen atom or a monovalent substituent. However, at least one of X.sup.1, X.sup.3, X.sup.5, or X.sup.7 and at least one of X.sup.2, X.sup.4, X.sup.6, or X.sup.8 represent a substituent including a group represented by General Formula (2).

##STR00002##

In General Formula (2), Z represents a single bond or —O—. Y.sup.1 and Y.sup.2 each independently represent a hydrogen atom or a hydrocarbon group not including an aryl group. *1 and *2 represent bonding positions.

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

##STR00001##