C07D321/10

Compounds for inhibition of alpha 4 beta 7 integrin

The present disclosure provides a compound of Formula (I): ##STR00001##
or a pharmaceutically acceptable salt thereof as described herein. The present disclosure also provides pharmaceutical compositions comprising a compound of Formula (I), processes for preparing compounds of Formula (I), and therapeutic methods for treating inflammatory disease.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent I or F, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X.sup.1, X.sup.2 and X.sup.3 each represent O or S, m1 and m7 represent an integer of 0 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, at least one of m1, m2, m3 represents an integer of 1 or more, X.sup.4 represents a single bond, —CH.sub.2—, —O—, —S—, —CO—, —SO— or —SO.sub.2—, and AI.sup.− represents an organic anion.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent I or F, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X.sup.1, X.sup.2 and X.sup.3 each represent O or S, m1 and m7 represent an integer of 0 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, at least one of m1, m2, m3 represents an integer of 1 or more, X.sup.4 represents a single bond, —CH.sub.2—, —O—, —S—, —CO—, —SO— or —SO.sub.2—, and AI.sup.− represents an organic anion.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10, —O-L.sup.1-CO—O—R.sup.10; R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a hydroxy group, etc.; L.sup.1 represents an alkanediyl group; R.sup.10 represents an acid-labile group; X.sup.1, X.sup.2 and X.sup.3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, —CH.sub.2—, —O—, —S—, etc.; and AI.sup.− represents an organic anion.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10, —O-L.sup.1-CO—O—R.sup.10; R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a hydroxy group, etc.; L.sup.1 represents an alkanediyl group; R.sup.10 represents an acid-labile group; X.sup.1, X.sup.2 and X.sup.3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, —CH.sub.2—, —O—, —S—, etc.; and AI.sup.− represents an organic anion.

BENZAMIDE DERIVATIVES AS CGAS-STING PATHWAY AGONISTS
20210347752 · 2021-11-11 ·

Pharmaceutical compositions of the invention comprise functionalized benzamide derivatives useful as cyclic GMP-AMP synthase-Stimulator of interferon gene (cGAS-STING) pathway agonists, and useful for treating viral diseases and boost antitumor immunity.

BENZAMIDE DERIVATIVES AS CGAS-STING PATHWAY AGONISTS
20210347752 · 2021-11-11 ·

Pharmaceutical compositions of the invention comprise functionalized benzamide derivatives useful as cyclic GMP-AMP synthase-Stimulator of interferon gene (cGAS-STING) pathway agonists, and useful for treating viral diseases and boost antitumor immunity.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10 or —O-L.sup.1-CO—O—R.sup.10, L.sup.1 represents an alkanediyl group, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R.sup.10 represents an acid-labile group, X.sup.1, X.sup.2 and X.sup.3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

A salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10 or —O-L.sup.1-CO—O—R.sup.10, L.sup.1 represents an alkanediyl group, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R.sup.10 represents an acid-labile group, X.sup.1, X.sup.2 and X.sup.3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

Salt, acid generator, resist composition and method for producing resist pattern

A salt represented by formula (I), an acid generator and a resist composition: ##STR00001##
wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10 or —O-L.sup.1-CO—O—R.sup.10, L.sup.1 represents an alkanediyl group, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R.sup.10 represents an acid-labile group, X.sup.1, X.sup.2 and X.sup.3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.