A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion ##STR00001##

A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion ##STR00001##

Disclosed are compounds for medical uses, for example, compounds of formula Ia,

##STR00001##

wherein A.sub.1, A.sub.2, A.sub.3, A.sub.4, A.sub.5, A.sub.6, A.sub.7, R.sub.6, R.sub.7 and E are as described herein, pharmaceutical compositions containing such compounds, and methods of treating or preventing a disease or condition, for example, cancer.

Disclosed are compounds for medical uses, for example, compounds of formula Ia,

##STR00001##

wherein A.sub.1, A.sub.2, A.sub.3, A.sub.4, A.sub.5, A.sub.6, A.sub.7, R.sub.6, R.sub.7 and E are as described herein, pharmaceutical compositions containing such compounds, and methods of treating or preventing a disease or condition, for example, cancer.

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar.sup.1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar.sup.1; and R.sup.G represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like. ##STR00001##

A process for the purification of organic sulfur compounds involves bringing the organic sulfur compounds, in a liquid phase, into contact with an oxide of a metal from groups VIIb or VIIIb and an oxide of a metal from groups Ia to IIIa of the periodic system, or alternatively, with a mixed-oxide thereof; for a contact period of at least 1 minute. Afterwards, the oxides and the organic sulfur compounds are separated.

A process for the purification of organic sulfur compounds involves bringing the organic sulfur compounds, in a liquid phase, into contact with an oxide of a metal from groups VIIb or VIIIb and an oxide of a metal from groups Ia to IIIa of the periodic system, or alternatively, with a mixed-oxide thereof; for a contact period of at least 1 minute. Afterwards, the oxides and the organic sulfur compounds are separated.

A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R.sup.1, R.sup.2, R.sup.3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NR.sup.a—. R.sup.a represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A.sup.− represents —SO.sub.3.sup.− or —CO.sub.2.sup.−. M.sup.+ represents a monovalent onium cation. ##STR00001##

A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R.sup.1, R.sup.2, R.sup.3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NR.sup.a—. R.sup.a represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A.sup.− represents —SO.sub.3.sup.− or —CO.sub.2.sup.−. M.sup.+ represents a monovalent onium cation. ##STR00001##