A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion

##STR00001##

A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion

##STR00001##

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

##STR00001##

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

##STR00001##

A process prepares a compound containing at least one cyclic monothiocarbonate group, wherein a salt of an acidic compound with at least one acidic hydrogen atom is reacted with a compound of formula (I),

##STR00001##

wherein one of the groups R.sup.1 to R.sup.4 is a group of formula (II), -A-X, with A representing an organic group with at least one carbon atom and X representing a halide, and the remaining groups R.sup.1 to R.sup.4 independently from each other represent hydrogen or an organic group with 1 to 50 carbon atoms.

A process prepares a compound containing at least one cyclic monothiocarbonate group, wherein a salt of an acidic compound with at least one acidic hydrogen atom is reacted with a compound of formula (I),

##STR00001##

wherein one of the groups R.sup.1 to R.sup.4 is a group of formula (II), -A-X, with A representing an organic group with at least one carbon atom and X representing a halide, and the remaining groups R.sup.1 to R.sup.4 independently from each other represent hydrogen or an organic group with 1 to 50 carbon atoms.

A process prepares a prepolymer containing a urethane group and a curable silicon-functional group, or a prepolymer of formula (IV), ##STR00001##
The prepolymer may be cured to a cross-linked polymer by ambient moisture and is therefore suitable for use as a component in a one-component sealant or adhesive composition.

A process prepares a prepolymer containing a urethane group and a curable silicon-functional group, or a prepolymer of formula (IV), ##STR00001##
The prepolymer may be cured to a cross-linked polymer by ambient moisture and is therefore suitable for use as a component in a one-component sealant or adhesive composition.

The present invention concerns new fragrant and aromatic compounds presenting peach, fruity and/or exotic fruit notes, but with no lactonic and fat aspects. More specifically, new spirooxathiolanone-type compounds responding to the following general formula (I) are disclosed: ##STR00001##
as well as a method for synthesising said compounds and their uses.

The present invention concerns new fragrant and aromatic compounds presenting peach, fruity and/or exotic fruit notes, but with no lactonic and fat aspects. More specifically, new spirooxathiolanone-type compounds responding to the following general formula (I) are disclosed: ##STR00001##
as well as a method for synthesising said compounds and their uses.