An electrochemical apparatus, including a positive electrode, a negative electrode, an separator, and an electrolyte, wherein the positive electrode comprises a current collector and a positive active material layer, and the positive active material layer comprises a positive active material; and the electrolyte comprises a compound of Formula I:

##STR00001## wherein R.sub.11, R.sub.12, R.sub.13, R.sub.14, R.sub.15 and R.sub.16 are each independently selected from: H, halogen, and the following substituted or unsubstituted groups: a C.sub.1-8 alkyl group, a C.sub.2-8 alkenyl group, a C.sub.2-8 alkynyl group, or a C.sub.6-12 aryl group; and an amount of the compound of Formula I required per 1 g of the positive active material is about 0.001 g to about 0.064 g. The present application can effectively improve high-temperature storage and high-temperature cycle performance of an electrochemical apparatus.

To solve the problem that the existing non-aqueous electrolyte for a lithium ion battery cannot ensure the high-temperature storage performance and cycle performance at the same time, the invention provides a non-aqueous electrolyte for a lithium ion battery, comprising a solvent, a lithium salt and a compound represented by structural formula 1 and/or structural formula 2:

##STR00001##

Meanwhile, the invention also discloses a lithium ion battery comprising the non-aqueous electrolyte for a lithium ion battery. The non-aqueous electrolyte provided by the invention can effectively improve the cycle performance and high-temperature storage performance of lithium ion batteries.

A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion. ##STR00001##

A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion. ##STR00001##

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

##STR00001##

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

##STR00001##

A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

Provided is a process for the preparation of a compound with at least one five-membered cyclic monothiocarbonate group. A compound C1 with at least one halohydrin group is used as starting material. Compound C1 is reacted with phosgene or an alkyl chloroformate to give an adduct C2. The adduct C2 is reacted with a compound that includes anionic sulfur to obtain the compound with at least one five-membered cyclic monothiocarbonate group.

Provided is a process for the preparation of a compound with at least one five-membered cyclic monothiocarbonate group. A compound C1 with at least one halohydrin group is used as starting material. Compound C1 is reacted with phosgene or an alkyl chloroformate to give an adduct C2. The adduct C2 is reacted with a compound that includes anionic sulfur to obtain the compound with at least one five-membered cyclic monothiocarbonate group.