The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

The application discloses an organic compound, an electronic element with the organic compound, and an electronic device including the electronic element. The organic compound of the present application has a fused heteroaromatic group containing fluorenyl or silylfluorenyl as its core structure, which presents a large planar structure in a three-dimensional (3D) space; and an electron-rich arylamine or heteroarylamine substituent is introduced at position 9 of the fluorenyl or silylfluorenyl to make the compound have excellent hole transport performance.

The application discloses an organic compound, an electronic element with the organic compound, and an electronic device including the electronic element. The organic compound of the present application has a fused heteroaromatic group containing fluorenyl or silylfluorenyl as its core structure, which presents a large planar structure in a three-dimensional (3D) space; and an electron-rich arylamine or heteroarylamine substituent is introduced at position 9 of the fluorenyl or silylfluorenyl to make the compound have excellent hole transport performance.

The application discloses an organic compound, an electronic element with the organic compound, and an electronic device including the electronic element. The organic compound of the present application has a fused heteroaromatic group containing fluorenyl or silylfluorenyl as its core structure, which presents a large planar structure in a three-dimensional (3D) space; and an electron-rich arylamine or heteroarylamine substituent is introduced at position 9 of the fluorenyl or silylfluorenyl to make the compound have excellent hole transport performance.

The application discloses an organic compound, an electronic element with the organic compound, and an electronic device including the electronic element. The organic compound of the present application has a fused heteroaromatic group containing fluorenyl or silylfluorenyl as its core structure, which presents a large planar structure in a three-dimensional (3D) space; and an electron-rich arylamine or heteroarylamine substituent is introduced at position 9 of the fluorenyl or silylfluorenyl to make the compound have excellent hole transport performance.

The present disclosure provides γ-diketones or analogs thereof, that activate Wnt/β-catenin signaling and thus treat or prevent diseases related to signal transduction, such as osteoporosis and osteoarthropathy; osteogenesis imperfecta, bone defects, bone fractures, periodontal disease, otosclerosis, wound healing, craniofacial defects, oncolytic bone disease, traumatic brain injuries or spine injuries, brain atrophy/neurological disorders related to the differentiation and development of the central nervous system, including Parkinson's disease, strokes, ischemic cerebral disease, epilepsy, Alzheimer's disease, depression, bipolar disorder, schizophrenia; otic disorders like cochlear hair cell loss; eye diseases such as age related macular degeneration, diabetic macular edema or retinitis pigmentosa and diseases related to differentiation and growth of stem cell, such as hair loss, hematopoiesis related diseases and tissue regeneration related diseases.

The present disclosure provides γ-diketones or analogs thereof, that activate Wnt/β-catenin signaling and thus treat or prevent diseases related to signal transduction, such as osteoporosis and osteoarthropathy; osteogenesis imperfecta, bone defects, bone fractures, periodontal disease, otosclerosis, wound healing, craniofacial defects, oncolytic bone disease, traumatic brain injuries or spine injuries, brain atrophy/neurological disorders related to the differentiation and development of the central nervous system, including Parkinson's disease, strokes, ischemic cerebral disease, epilepsy, Alzheimer's disease, depression, bipolar disorder, schizophrenia; otic disorders like cochlear hair cell loss; eye diseases such as age related macular degeneration, diabetic macular edema or retinitis pigmentosa and diseases related to differentiation and growth of stem cell, such as hair loss, hematopoiesis related diseases and tissue regeneration related diseases.

An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition by which a pattern having excellent LWR performance can be formed. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.

The actinic ray-sensitive or radiation-sensitive resin composition according to an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including an acid-decomposable resin including a repeating unit having an acid-decomposable group in which an acid group having a pKa of 13 or less is protected by a leaving group that leaves by an action of an acid, and one or more compounds that generate an acid upon irradiation with actinic rays or radiation, which are selected from a compound (I) and a compound (II),

in which the content of the acid-decomposable resin is 10% by mass or more with respect to a total solid content of the composition,

the content of the compounds that generate an acid upon irradiation with actinic rays or radiation is 10% by mass or more with respect to the total solid content of the composition, and

the acid-decomposable resin has a halogen atom in a repeating unit other than the repeating unit having a group that generates an acid upon irradiation with actinic rays or radiation.

A polymer comprising recurring units derived from a sulfonium salt of specific structure having a polymerizable group is coated to form a resist film which is amenable to precise micropatterning because of improved LWR, CDU and resolution.