An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by general formula (S1) and an acid decomposable resin. In the general formula (S1), Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, and Q.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, or Q.sup.5 represents a substituent including an aryloxy group represented by general formula (QR1), Lq.sup.1 represents a single bond or a divalent linking group; and M.sup.+ represents an organic cation. In the general formula (QR1), G.sup.1, G.sup.2, G.sup.3, G.sup.4, and G.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of G.sup.1, G.sup.2, G.sup.3, G.sup.4, or G.sup.5 represents a substituent including an ester group; and * represents a bonding position.

##STR00001##

An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by general formula (S1) and an acid decomposable resin. In the general formula (S1), Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, and Q.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, or Q.sup.5 represents a substituent including an aryloxy group represented by general formula (QR1), Lq.sup.1 represents a single bond or a divalent linking group; and M.sup.+ represents an organic cation. In the general formula (QR1), G.sup.1, G.sup.2, G.sup.3, G.sup.4, and G.sup.5 each independently represent a hydrogen atom or a substituent, provided that at least one of G.sup.1, G.sup.2, G.sup.3, G.sup.4, or G.sup.5 represents a substituent including an ester group; and * represents a bonding position.

##STR00001##

A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent.

R.sup.1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X.sup.1 and X.sup.2 are each independently a single bond, O, S or NR wherein R is a hydrogen atom or a monovalent hydrocarbon group. In a case where X.sup.1 is NR, R.sup.2 is a monovalent organic group or a hydrogen atom. In a case where X.sup.2 is NR, R.sup.3 is a monovalent organic group or a hydrogen atom. In a case where neither X.sup.1 nor X.sup.2 is NR, R.sup.2 and R.sup.3 are each independently a monovalent organic group.

##STR00001##

A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent.

R.sup.1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X.sup.1 and X.sup.2 are each independently a single bond, O, S or NR wherein R is a hydrogen atom or a monovalent hydrocarbon group. In a case where X.sup.1 is NR, R.sup.2 is a monovalent organic group or a hydrogen atom. In a case where X.sup.2 is NR, R.sup.3 is a monovalent organic group or a hydrogen atom. In a case where neither X.sup.1 nor X.sup.2 is NR, R.sup.2 and R.sup.3 are each independently a monovalent organic group.

##STR00001##

The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

A compound of Chemical Formula 1, and a photoelectric device, an image sensor, and an electronic device including the same are disclosed:

##STR00001##

In Chemical Formula 1, each substituent is the same as defined in the detailed description.

A compound of Chemical Formula 1, and a photoelectric device, an image sensor, and an electronic device including the same are disclosed:

##STR00001##

In Chemical Formula 1, each substituent is the same as defined in the detailed description.

A salt represented by the formula (I):

##STR00001##

An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.
M.sub.1.sup.+A.sup.?-L-B.sup.?M.sub.2.sup.+(I)