An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y.sub.1 and Y.sub.2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A) ##STR00001##

An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y.sub.1 and Y.sub.2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A) ##STR00001##

A salt represented by formula (I):

##STR00001##

wherein Q.sup.1 and Q.sup.2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group,
R.sup.1 and R.sup.2 independently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group,
z represents an integer of 0 to 6,
X.sup.1 represents *C(O)O, *OC(O), *OC(O)O or O, where * represents a binding site to C(R.sup.1)(R.sup.2) or C(Q.sup.1)(Q.sup.2)-,
A.sup.1 represents a C2-C36 divalent hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a substituent,
R.sup.3 represents a hydrogen atom or a methyl group, and
Z.sup.+ represents an organic cation.

A salt represented by formula (I):

##STR00001##

wherein R.sup.1 and R.sup.2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group,
X.sup.1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and
A.sup. represents an organic anion.

Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): ##STR00001##
in the formulae, each of Y.sub.1 and Y.sub.2 represents a monovalent organic group; each of M.sub.1.sup.+ and M.sub.2.sup.+ represents an organic onium ion; each of X.sub.1 and X.sub.2 represents a group that is represented by S, NH, or NR.sup.1; R.sup.1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R.sup.1 and Y.sub.1 or Y.sub.2 may bond with each other to form a ring.

Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): ##STR00001##
in the formulae, each of Y.sub.1 and Y.sub.2 represents a monovalent organic group; each of M.sub.1.sup.+ and M.sub.2.sup.+ represents an organic onium ion; each of X.sub.1 and X.sub.2 represents a group that is represented by S, NH, or NR.sup.1; R.sup.1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R.sup.1 and Y.sub.1 or Y.sub.2 may bond with each other to form a ring.

A photoacid generator (PAG) and a photoresist composition, the PAG being represented by the following Chemical Formula (I):

##STR00001## wherein, in Chemical Formula (I), L is sulfur (S) or iodine (I), R.sub.3 being omitted when L is I; R.sub.1, R.sub.2, and R.sub.3 are each independently a C1 to C10 alkyl, alkenyl, alkynyl, or alkoxy group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L, or a C6 to C18 aryl, arylalkyl, or alkylaryl group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L; AL is an acid-labile group; m is 1 to 4; and M is a C1 to C30 hydrocarbon group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and a sulfur atom.

A photoacid generator (PAG) and a photoresist composition, the PAG being represented by the following Chemical Formula (I):

##STR00001## wherein, in Chemical Formula (I), L is sulfur (S) or iodine (I), R.sub.3 being omitted when L is I; R.sub.1, R.sub.2, and R.sub.3 are each independently a C1 to C10 alkyl, alkenyl, alkynyl, or alkoxy group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L, or a C6 to C18 aryl, arylalkyl, or alkylaryl group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and L; AL is an acid-labile group; m is 1 to 4; and M is a C1 to C30 hydrocarbon group that is unsubstituted or substituted with a heteroatom such that the heteroatom is pendant or is between the group and a sulfur atom.

An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. ##STR00001## (In the formula, each of R.sup.1a and R.sup.1b is a hydrogen atom or a hydroxy protective group; R.sup.2 is a hydroxy group or the like; and R.sup.3 is a hydroxy group or the like.)

An object of the present invention is to provide a novel compound useful for manufacturing salacinol, a method for manufacturing the compound, a method for manufacturing salacinol, methods for protecting and deprotecting a diol group, and a protective agent for a diol group. A compound represented by Formula (1) is a compound useful for manufacturing salacinol. ##STR00001## (In the formula, each of R.sup.1a and R.sup.1b is a hydrogen atom or a hydroxy protective group; R.sup.2 is a hydroxy group or the like; and R.sup.3 is a hydroxy group or the like.)