The present specification provides a compound having a spiro structure, and an organic light emitting device including the same.

An organic light-emitting device includes a heterocyclic compound represented by Formula 1 ##STR00001##
In Formula 1, X is O or S, one selected from R.sub.1 to R.sub.8 is a group represented by Formula 2-1, and one selected from the remaining groups is a group represented by Formula 2-2, wherein, when X is O, one selected from R.sub.1, R.sub.2, R.sub.4, R.sub.5, R.sub.7, and R.sub.8 is a group represented by Formula 2-1.

The compound represented by formula (1):

##STR00001##

wherein symbols are as defined in the description, provides an organic electroluminescence device having a device performance further improved.

The compound represented by formula (1):

##STR00001##

wherein symbols are as defined in the description, provides an organic electroluminescence device having a device performance further improved.

Provided is an organic light emitting device including a light emitting layer comprising a compound of Chemical Formula 1 and a first organic material layer comprising a compound of Chemical Formula 2:

##STR00001## wherein: Cy1 to Cy5 are each independently one selected from among a substituted or unsubstituted: aromatic hydrocarbon ring, aliphatic hydrocarbon ring, and aromatic hetero ring, or a ring in which two or more rings selected from the above group are fused, one or more of Cy1 to Cy5 are a ring of Chemical Formula 1-A:

##STR00002## one to three of a* to d* are a position fused to or linked to Chemical Formula 1;

##STR00003## L1 to L3 are each independently a direct bond or a substituted or unsubstituted: arylene or divalent heterocyclic group; and Ar1 and Ar2 are each independently a substituted or unsubstituted: aryl or heterocyclic group.

Provided is an organic light emitting device including a light emitting layer comprising a compound of Chemical Formula 1 and a first organic material layer comprising a compound of Chemical Formula 2:

##STR00001## wherein: Cy1 to Cy5 are each independently one selected from among a substituted or unsubstituted: aromatic hydrocarbon ring, aliphatic hydrocarbon ring, and aromatic hetero ring, or a ring in which two or more rings selected from the above group are fused, one or more of Cy1 to Cy5 are a ring of Chemical Formula 1-A:

##STR00002## one to three of a* to d* are a position fused to or linked to Chemical Formula 1;

##STR00003## L1 to L3 are each independently a direct bond or a substituted or unsubstituted: arylene or divalent heterocyclic group; and Ar1 and Ar2 are each independently a substituted or unsubstituted: aryl or heterocyclic group.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, *—O—R.sup.10, *—O-L.sup.10-CO—O—R.sup.10, etc.; L.sup.10 represents an alkanediyl group; R.sup.10 represents an acid-labile group; R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc.; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, —CH.sub.2—, etc.; and Al.sup.− represents an organic anion.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, *—O—R.sup.10, *—O-L.sup.10-CO—O—R.sup.10, etc.; L.sup.10 represents an alkanediyl group; R.sup.10 represents an acid-labile group; R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc.; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 and m7 represent an integer of 0 to 5, m2 to m6, m8 and m9 represent an integer of 0 to 4, 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, —CH.sub.2—, etc.; and Al.sup.− represents an organic anion.

A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar.sup.1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R.sup.1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L.sup.1 represents a divalent linking group; R.sup.2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X.sup.+ represents a monovalent radiation-sensitive onium cation.

##STR00001##

A radiation-sensitive resin composition includes: a polymer, solubility of which in a developer solution is capable of being altered by an action of an acid; a radiation-sensitive acid generator; and a compound represented by formula (1). Ar.sup.1 represents a group obtained by removing (a+b+2) hydrogen atoms from an aromatic hydrocarbon ring having 6 to 30 ring atoms; R.sup.1 represents a halogen atom or a monovalent organic group having 1 to 20 carbon atoms; L.sup.1 represents a divalent linking group; R.sup.2 represents a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms; a is an integer of 0 to 10, b is an integer of 1 to 10, wherein a sum of a and b is no greater than 10; and X.sup.+ represents a monovalent radiation-sensitive onium cation.

##STR00001##