A composition having: 30% to 35% by weight of a first polydimethylsiloxane having vinyl moieties, wherein at least 0.10% by weight of the first polydimethylsiloxane is attributed to the vinyl moieties; 20% to 25% by weight of a second polydimethylsiloxane having vinyl moieties, wherein at least 0.20% by weight of the second polydimethylsiloxane is attributed to the vinyl moieties; 7% to 10% by weight of a third polydimethylsiloxane having hydroxyl moieties, wherein at least 2.0% by weight of the third polydimethylsiloxane is attributed to the hydroxyl moieties; 22% to 35% by weight fumed silicon dioxide, wherein the fumed silicon dioxide has a surface area of at least 150 square meters per gram; 0.2% to 1.0% by weight a blowing agent; 0.15% to 0.5% by weight active boron; and 0.25% to 1.00% by weight active peroxide.

A composition having: 30% to 35% by weight of a first polydimethylsiloxane having vinyl moieties, wherein at least 0.10% by weight of the first polydimethylsiloxane is attributed to the vinyl moieties; 20% to 25% by weight of a second polydimethylsiloxane having vinyl moieties, wherein at least 0.20% by weight of the second polydimethylsiloxane is attributed to the vinyl moieties; 7% to 10% by weight of a third polydimethylsiloxane having hydroxyl moieties, wherein at least 2.0% by weight of the third polydimethylsiloxane is attributed to the hydroxyl moieties; 22% to 35% by weight fumed silicon dioxide, wherein the fumed silicon dioxide has a surface area of at least 150 square meters per gram; 0.2% to 1.0% by weight a blowing agent; 0.15% to 0.5% by weight active boron; and 0.25% to 1.00% by weight active peroxide.

A composition having: 30% to 35% by weight of a first polydimethylsiloxane having vinyl moieties, wherein at least 0.10% by weight of the first polydimethylsiloxane is attributed to the vinyl moieties; 20% to 25% by weight of a second polydimethylsiloxane having vinyl moieties, wherein at least 0.20% by weight of the second polydimethylsiloxane is attributed to the vinyl moieties; 7% to 10% by weight of a third polydimethylsiloxane having hydroxyl moieties, wherein at least 2.0% by weight of the third polydimethylsiloxane is attributed to the hydroxyl moieties; 22% to 35% by weight fumed silicon dioxide, wherein the fumed silicon dioxide has a surface area of at least 150 square meters per gram; 0.15% to 0.5% by weight active boron; and 0.25% to 1.00% by weight active peroxide.

A composition having: 30% to 35% by weight of a first polydimethylsiloxane having vinyl moieties, wherein at least 0.10% by weight of the first polydimethylsiloxane is attributed to the vinyl moieties; 20% to 25% by weight of a second polydimethylsiloxane having vinyl moieties, wherein at least 0.20% by weight of the second polydimethylsiloxane is attributed to the vinyl moieties; 7% to 10% by weight of a third polydimethylsiloxane having hydroxyl moieties, wherein at least 2.0% by weight of the third polydimethylsiloxane is attributed to the hydroxyl moieties; 22% to 35% by weight fumed silicon dioxide, wherein the fumed silicon dioxide has a surface area of at least 150 square meters per gram; 0.15% to 0.5% by weight active boron; and 0.25% to 1.00% by weight active peroxide.

Described herein are antipathogenic compositions comprising a nitride chosen from aluminum nitride, boron nitride, chromium nitride, cerium nitride, hafnium nitride, lanthanum nitride, phosphorous nitride, sulfur nitride, tantalum nitride, titanium nitride, vanadium nitride, yttrium nitride, zirconium nitride, silicon nitride, or combinations thereof, and methods of using said compositions to inactivate viruses, bacteria, and/or fungi.

Described herein are antipathogenic compositions comprising a nitride chosen from aluminum nitride, boron nitride, chromium nitride, cerium nitride, hafnium nitride, lanthanum nitride, phosphorous nitride, sulfur nitride, tantalum nitride, titanium nitride, vanadium nitride, yttrium nitride, zirconium nitride, silicon nitride, or combinations thereof, and methods of using said compositions to inactivate viruses, bacteria, and/or fungi.

Described herein are antipathogenic compositions comprising a nitride chosen from aluminum nitride, boron nitride, chromium nitride, cerium nitride, hafnium nitride, lanthanum nitride, phosphorous nitride, sulfur nitride, tantalum nitride, titanium nitride, vanadium nitride, yttrium nitride, zirconium nitride, silicon nitride, or combinations thereof, and methods of using said compositions to inactivate viruses, bacteria, and/or fungi.

The present invention relates to compositions providing improved preservative efficacy. The present invention further relates to polyquaternium compound containing compositions having improved the antifungal activity. In certain embodiments, the present invention relates to ophthalmic compositions comprising a polyquaternium compound, a polyol or combination of polyols, borate compound, and an antimicrobial mixture comprising electrolytes and nutrients.

The present invention relates to compositions providing improved preservative efficacy. The present invention further relates to polyquaternium compound containing compositions having improved the antifungal activity. In certain embodiments, the present invention relates to ophthalmic compositions comprising a polyquaternium compound, a polyol or combination of polyols, borate compound, and an antimicrobial mixture comprising electrolytes and nutrients.

The present invention relates to compositions providing improved preservative efficacy. The present invention further relates to polyquaternium compound containing compositions having improved the antifungal activity. In certain embodiments, the present invention relates to ophthalmic compositions comprising a polyquaternium compound, a polyol or combination of polyols, borate compound, and an antimicrobial mixture comprising electrolytes and nutrients.