Patent classifications
C07D493/18
METHODS OF SYNTHESIZING HIGH-PURITY CANNABICYCLOL AND ARTIFICIAL RESINS COMPRISING CANNABICYCLOL
Compositions having enhanced cannabicyclol (CBL) or CBL derivative concentrations are disclosed herein as are methods of synthesizing CBL and CBL derivative in high-purity form. Relative to conventional methods, the methods of the present disclosure may: (i) be better suited to large-scale conditions in that they do not require dangerous and/or toxic solvents and/or reagents; (ii) be more tolerant of complex starting compositions, such as cannabinoid extracts, isolates and/or distillates; (iii) provide CBL and/or CBL derivative at higher yield; (iv) provide easier methods to purify product mixtures comprising CBL and/or CBL derivative; (v) provide product mixtures that comprise unique ratios of CBL or CBL derivative relative to other cannabinoids; (vi) provide product mixtures with reduced THC concentrations and/or (vii) provide artificial resins having of a mixture cannabinoids that cannot be produced by extracting cannabis plant material.
Chemical Process for the Preparation of Herbicidal Pyridazine Compounds
The present invention provides, inter alia, a process for producing a compound of formula (I) wherein the substituents are as defined in claim 1, comprising reacting a compound of formula (II) in a suitable reaction medium comprising a desulfurization agent formula (II). The present invention further provides intermediate compounds utilised in said process, and methods for producing said intermediate compounds.
##STR00001##
Chemical Process for the Preparation of Herbicidal Pyridazine Compounds
The present invention provides, inter alia, a process for producing a compound of formula (I) wherein the substituents are as defined in claim 1, comprising reacting a compound of formula (II) in a suitable reaction medium comprising a desulfurization agent formula (II). The present invention further provides intermediate compounds utilised in said process, and methods for producing said intermediate compounds.
##STR00001##
CANNABICITRAN COMPOSITIONS AND METHODS OF SYNTHESIZING CANNABICITRAN
Compositions having enhanced cannabicitran concentrations and/or enhanced cannabicitran-derivative concentrations are disclosed herein as are methods of synthesizing cannabicitran and/or cannabicitran derivatives. Relative to conventional methods, the methods of the present disclosure may: (i) be better suited to large-scale conditions in that they do not require dangerous and/or toxic solvents and/or reagents; (ii) be more tolerant of complex starting compositions, such as cannabinoid isolates and/or distillates; (iii) provide cannabicitran and/or cannabicitran derivatives at higher yield; (iv) provide easier to purify product mixtures comprising cannabicitran and/or cannabicitran derivatives; (v) provide product mixtures comprising cannabicitran or cannabicitran derivatives that are easier to purify; (vi) provide product mixtures that comprise unique ratios of cannabicitran or cannabicitran derivatives relative to other cannabinoids; and/or (vii) provide product mixtures with reduced THC concentrations.
CANNABICITRAN COMPOSITIONS AND METHODS OF SYNTHESIZING CANNABICITRAN
Compositions having enhanced cannabicitran concentrations and/or enhanced cannabicitran-derivative concentrations are disclosed herein as are methods of synthesizing cannabicitran and/or cannabicitran derivatives. Relative to conventional methods, the methods of the present disclosure may: (i) be better suited to large-scale conditions in that they do not require dangerous and/or toxic solvents and/or reagents; (ii) be more tolerant of complex starting compositions, such as cannabinoid isolates and/or distillates; (iii) provide cannabicitran and/or cannabicitran derivatives at higher yield; (iv) provide easier to purify product mixtures comprising cannabicitran and/or cannabicitran derivatives; (v) provide product mixtures comprising cannabicitran or cannabicitran derivatives that are easier to purify; (vi) provide product mixtures that comprise unique ratios of cannabicitran or cannabicitran derivatives relative to other cannabinoids; and/or (vii) provide product mixtures with reduced THC concentrations.
1,2,4-TRIOXANE COMPOUNDS AND COMPOSITIONS COMPRISING THE SAME FOR USE IN THE PREVENTION AND TREATMENT OF CANCER
The present invention relates to anti-cancer agents comprising 1,2,4-trioxane compounds and anti-cancer agents comprising combinations comprising 1,2,4-trioxane compounds and chlorogenic acids. The invention further provides pharmaceutical compositions comprising such anti-cancer agents, kits comprising the same as well as methods and treatment regimens of using the aforementioned anti-cancer agents, pharmaceutical compositions and kits in the treatment and prevention of cancer and for prolonging survival of subjects having cancer, in particular ovarian cancer or lung cancer.
IMPROVED PROCESS FOR THE PREPARATION OF A BENZENE COMPOUND
A benzene compound is prepared by reacting a furan compound to produce an unsaturated bicyclic ether having an unsaturated carbon-carbon bond; hydrogenating the unsaturated carbon-carbon bond in the unsaturated bicyclic ether to produce a saturated bicyclic ether; and dehydrating and aromatizing the saturated bicyclic ether to produce the benzene compound.
IMPROVED PROCESS FOR THE PREPARATION OF A BENZENE COMPOUND
A benzene compound is prepared by reacting a furan compound to produce an unsaturated bicyclic ether having an unsaturated carbon-carbon bond; hydrogenating the unsaturated carbon-carbon bond in the unsaturated bicyclic ether to produce a saturated bicyclic ether; and dehydrating and aromatizing the saturated bicyclic ether to produce the benzene compound.
NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.
##STR00001##
NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.
##STR00001##