A trichlorogermanide of formula (I): [R.sub.4N]/[R.sub.4P]Cl[GeCl.sub.3] (I), where R is Me, Et, iPr, nBu, or Ph, tris(trichlorosilyl)germanide of formula (II): [R.sub.4N]/[R.sub.rP][Ge(SiCl.sub.3).sub.3] (II), where R is Me, Et, iPr, nBu, or Ph, a tris(trichlorosilyl)germanide adduct of GaCl.sub.3 of formula (III): [Ph.sub.4P][Ge(SiCl.sub.3).sub.3*GaCl.sub.3], and a tris(trichlorosilyl)germanide adduct of BBr.sub.3 of formula (IV): [Ph.sub.4P][Ge(SiCl.sub.3).sub.3*BBr.sub.3]. Also, methods for preparing the trichlorogermanides of formula (I), the tris(trichlorosilyl)germanide of formula (II), the tris(trichlorosilyl)germanide adduct of BBr.sub.3 of formula (IV).

Siloxanes are prepared by reacting: a compound A with a compound B or a compound A with a compound C or a compound B with a compound C or a compound C alone,
in the presence of a compound D at 40 C., wherein compound A is a silane or a siloxane having at least one silicon-bonded hydrogen atom, compound B is a silane or a siloxane having at least one silicon-bonded alkoxy moiety, compound C is a silane or a siloxane having at least one silicon-bonded hydrogen atom and at least one silicon-bonded alkoxy moiety, and compound D is a cationic Si(II) compound.

Functionalized Group IVA particles, methods of preparing the Group IVA particles, and methods of using the Group IVA particles are provided. The Group IVA particles may be passivated with at least one layer of material covering at least a portion of the particle. The layer of material may be a covalently bonded non-dielectric layer of material. The Group IVA particles may be used in various technologies, including lithium ion batteries and photovoltaic cells.

A method of making an organoaminosilane compound, comprising i) combining A) a compound comprising a primary or secondary amine, B) monosilane (SiH.sub.4), and C) a catalyst, where the catalyst comprises magnesium or boron, where A), B) and C) are combined under sufficient conditions to form the organoaminosilane compound and hydrogen. A method of making a silylamine, the method comprising: i) forming an organoaminosilane compound by i) combining A) a compound comprising a primary or secondary amine, B) monosilane (SiH.sub.4), and C) a catalyst, where the catalyst comprises magnesium or boron, and ii) combining ammonia and the organoaminosilane compound produced in i) under sufficient conditions to form a silylamine product and a byproduct, where the byproduct is a primary or secondary amine.

A method of making an aminosilane, the method comprising: forming a reaction mixture comprising a hydridosilane, an amine and a dehydrogenative coupling catalyst in a reactor; subjecting the reaction mixture to conditions sufficient to cause a dehydrogenative coupling reaction between the hydridosilane and the amine to form the aminosilane and hydrogen gas; and venting the hydrogen gas; wherein the forming of the reaction mixture comprising the hydridosilane, the amine and the dehydrogenative coupling catalyst comprises continuously feeding the hydridosilane to the reactor containing the amine and the dehydrogenative coupling catalyst.

The present invention relates to novel microporous zirconium silicate compositions that are formulated to remove toxins, e.g. potassium ions, from the gastrointestinal tract at an elevated rate without causing undesirable side effects. The preferred formulations are designed avoid increase in pH of urine in patients and/or avoid potential entry of particles into the bloodstream of the patient. Also disclosed is a method for preparing high purity crystals of UZSi-9 exhibiting an enhanced level of potassium exchange capacity. These compositions are particularly useful in the therapeutic treatment of hyperkalemia.

Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.

The present invention provides processes for preparing silanylamines, such as disilanylamines and polysilanylamines, and compositions comprising the silanylamines. In one embodiment, the present invention provides processes for preparing a silanylamine compound, the processes comprising reacting a starting compound of general formula RR.sup.1N(Si.sub.xH.sub.2x+1) with an amine compound of general formula R.sup.2R.sup.3NH to produce the silanylamine compound of general formula R.sup.2.sub.mR.sup.3.sub.nN(Si.sub.xH.sub.2+1).sub.3-m-n.

An etchant composition includes a silane compound represented by the following Chemical Formula 1:

##STR00001## wherein R.sup.1 to R.sup.6 are independently hydrogen, halogen, a substituted or unsubstituted C.sub.1-C.sub.20 hydrocarbyl group, a phenyl group, a C.sub.1-C.sub.20 alkoxy group, a carboxy group, a carbonyl group, a nitro group, a tri(C.sub.1-C.sub.20) alkylsilyl group, a phosphoryl group, or a cyano group, L is a direct bond or C.sub.1-C.sub.3 hydrocarbylene, A is an n-valent radical, and n is an integer of 1 to 4.

The present disclosure relates to a method for producing tetraalkoxysilane continuously through direction of silicon metal with alcohol. In the method, a basic catalyst prepared in the absence of a solvent is used. Thus, it is possible to increase the proportion of the catalyst in the process, and to minimize production of impurities caused by solvent decomposition. In addition, it is possible to improve reaction efficiency and to simplify the purification process as compared to the method based on direct reaction according to the related art, and thus to produce tetraalkoxysilane with significantly higher cost efficiency as compared to the related art.