Patent classifications
C07F7/025
SILICON CHALCOGENATE PRECURSORS AND METHODS OF FORMING THE SILICON CHALCOGENATE PRECURSORS
A silicon chalcogenate precursor comprising the chemical formula of Si(XR.sup.1).sub.nR.sup.2.sub.4-n, where X is sulfur, selenium, or tellurium, R.sup.1 is hydrogen, an alkyl group, a substituted alkyl group, an alkoxide group, a substituted alkoxide group, an amide group, a substituted amide group, an amine group, a substituted amine group, or a halogen group, each R.sup.2 is independently hydrogen, an alkyl group, a substituted alkyl group, an alkoxide group, a substituted alkoxide group, an amide group, a substituted amide group, an amine group, a substituted amine group, or a halogen group, and n is 1, 2, 3, or 4. Methods of forming the silicon chalcogenate precursor, methods of forming silicon nitride, and methods of forming a semiconductor structure are also disclosed.
AMINE SUBSTITUTED TRISILYLAMINE AND TRIDISILYLAMINE COMPOUNDS AND SYNTHESIS METHODS THEREOF
Halogen free amine substituted trisilylamine and tridisilylamine compounds and a method of their preparation via dehydrogenative coupling between the corresponding unsubstituted trisilylames and amines catalyzed by transition metal catalysts is described. This new approach is based on the catalytic dehydrocoupling of a SiH and a NH moiety to form an SiN containing compound and hydrogen gas. The process can be catalyzed by transition metal heterogenous catalysts such as Ru(0) on carbon, Pd(0) on MgO) as well as transition metal organometallic complexes that act as homogeneous catalysts. The SiN containing products are halide free. Such compounds can be useful for the deposition of thin films by chemical vapor deposition or atomic layer deposition of Si containing films.
Process for preparing a composition containing 2-ethylhexyl silicate
A composition containing 2-ethylhexyl silicate, is produced by heating a reaction mixture of ethyl silicate with an excess amount of 2-ethylhexanol in the presence of titanium tetrabutoxide as catalyst to a temperature below the boiling point of 2-ethylhexanol while mixing, allowing the reaction mixture to react and, after the reaction, removing ethanol and excess 2-ethylhexanol from the reaction mixture by distillation and obtaining the composition containing 2-ethylhexyl silicate.
Methods for depositing films with organoaminodisilane precursors
Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I: ##STR00001##
wherein R.sup.1 is selected from linear or branched C.sub.3 to C.sub.10 alkyl group, linear or branched C.sub.3 to C.sub.10 alkenyl group, linear or branched C.sub.3 to C.sub.10 alkynyl group, C.sub.1 to C.sub.6 dialkylamino group, electron withdrawing group, and C.sub.6 to C.sub.10 aryl group; R.sup.2 is selected from hydrogen, linear or branched C.sub.1 to C.sub.10 alkyl group, linear or branched C.sub.3 to C.sub.6 alkenyl group, linear or branched C.sub.3 to C.sub.6 alkynyl group, C.sub.1 to C.sub.6 dialkylamino group, C.sub.6 to C.sub.10 aryl group, linear or branched C.sub.1 to C.sub.6 fluorinated alkyl group, electron withdrawing group, and C.sub.4 to C.sub.10 aryl group; optionally wherein R.sup.1 and R.sup.2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.
Triphenylene-based materials for organic electroluminescent devices
The present invention relates to compounds of the formula (1) and (2) ##STR00001##
which are suitable for use in electronic devices, in particular organic electroluminescent devices.
Organoaminodisilane precursors and methods for depositing films comprising same
Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is a precursor of following Formula I: ##STR00001##
wherein R.sup.1 and R.sup.3 are independently selected from linear or branched C.sub.3 to C.sub.10 alkyl group, a linear or branched C.sub.3 to C.sub.10 alkenyl group, a linear or branched C.sub.3 to C.sub.10 alkynyl group, a C.sub.1 to C.sub.6 dialkylamino group, an electron withdrawing and a C.sub.6 to C.sub.10 aryl group; R.sup.2 and R.sup.4 are independently selected from hydrogen, a linear or branched C.sub.3 to C.sub.10 alkyl group, a linear or branched C.sub.3 to C.sub.10 alkenyl group, a linear or branched C.sub.3 to C.sub.10 alkynyl group, a C.sub.1 to C.sub.6 dialkylamino group, an electron withdrawing, and a C.sub.6 to C.sub.10 aryl group; and wherein any one, all, or none of R.sup.1 and R.sup.2, R.sup.3 and R.sup.4, R.sup.1 and R.sup.3, or R.sup.2 and R.sup.4 are linked to form a ring.
MICROPOROUS ZIRCONIUM SILICATE FOR THE TREATMENT OF HYPERKALEMIA
The present invention relates to novel microporous zirconium silicate compositions that are formulated to remove toxins, e.g. potassium ions, from the gastrointestinal tract at an elevated rate without causing undesirable side effects. The preferred formulations are designed avoid increase in pH of urine in patients and/or avoid potential entry of particles into the bloodstream of the patient. Also disclosed is a method for preparing high purity crystals of UZSi-9 exhibiting an enhanced level of potassium exchange capacity. These compositions are particularly useful in the therapeutic treatment of hyperkalemia.
Compositions and Methods for the Deposition of Silicon Oxide Films
Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the following Formulae A and B:
##STR00001##
as defined herein.
Condensed silicon-carbon composite
A silicon-carbon composite. In order to improve the cycle stability of a lithium cell equipped therewith, the silicon-carbon composite is produced by a condensation reaction of silicon particles surface-modified with a first condensation-capable group and carbon particles surface-modified with a second condensation-capable group, the silicon particles being covalently bonded to the carbon particles via the condensation reaction product of the first condensation-capable group and the second condensation-capable group. In addition, a method for the production thereof and to an electrode, an electrode material, and a lithium cell is described.
3-GLYCIDYLOXYPROPYLTRIALKOXYSILANES HAVING LONG-CHAIN ALKOXY GROUPS, PROCESSES FOR PRODUCTION AND USE
A novel compound, which is 3-glycidyloxypropyltri(-2-propylheptoxy)silane. A process for producing a 3-glycidyloxypropyltrialkoxysilane having long-chain alkoxy groups of formula (I)
##STR00001## or of formula (II)
##STR00002##
where m=1 or 2, n=0 or 1, p=3, 4, 5, 6, 7, 8, 9 or 10, where the method includes heating 3-glycidyloxypropyltrimethoxysilane or 3-glycidyloxypropyltriethoxysilane, with a stoichiometric amount or an excess of a longer-chain alcohol from the group of the C5- to C16-alcohols, in the presence of titanium tetrabutoxide as catalyst, with stirring to a temperature of not more than 225 C., reacting, and then following the reaction by removing methanol/ethanol and excess reactant alcohol from the product mixture by distillation, optionally under reduced pressure. A method of using the 3-glycidyloxypropyltri(-2-propylheptoxy)silane for functionalization of rubber and using the rubber in treads for reducing rolling resistance in tires.