Patent classifications
C07F7/21
Synthesis of functional fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”)
A method of manufacturing a fluorinated polyhedral oligomeric silsesquioxane. The method for manufacture includes opening a single edge of a closed-cage F-POSS and bridging the opened, single edge with a sulfate group. The sulfate group is converted to a disilanol, which is then reacted with a functional dichlorosilane having an organic functional group comprising at least three carbon atoms.
FUNCTIONALIZED F-POSS MATERIALS AS ADDITIVES TO POLYMERS
Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
FUNCTIONALIZED F-POSS MATERIALS AS ADDITIVES TO POLYMERS
Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
ORGANOSILICON COMPOUND AND CURABLE COMPOSITION
A cyclic organosilicon compound having a (meth)acrylic group and a urea structure on a silicon atom cures into a product having improved flexibility, surface hardness, and evaporation amenability.
ORGANOSILICON COMPOUND AND CURABLE COMPOSITION
A cyclic organosilicon compound having a (meth)acrylic group and a urea structure on a silicon atom cures into a product having improved flexibility, surface hardness, and evaporation amenability.
PROCESS AND COMPOSITION FOR THE PRODUCTION OF FLEXIBLE POLYURETHANE FOAM
Disclosed are a process of producing a polyurethane foam product, a polyurethane foam product pre-mix, polyurethane foam product formulation, and a polyurethane foam product. The process of producing the polyurethane foam product includes contacting a halogen containing composition with a polyurethane foam product pre-mix. The polyurethane foam product pre-mix includes the halogen containing composition. The polyurethane foam product formulation includes a polyol component, an isocyanate component, and a halogen containing compound component. The polyurethane foam product is formed by the pre-mix having the halogen containing composition.
PROCESS AND COMPOSITION FOR THE PRODUCTION OF FLEXIBLE POLYURETHANE FOAM
Disclosed are a process of producing a polyurethane foam product, a polyurethane foam product pre-mix, polyurethane foam product formulation, and a polyurethane foam product. The process of producing the polyurethane foam product includes contacting a halogen containing composition with a polyurethane foam product pre-mix. The polyurethane foam product pre-mix includes the halogen containing composition. The polyurethane foam product formulation includes a polyol component, an isocyanate component, and a halogen containing compound component. The polyurethane foam product is formed by the pre-mix having the halogen containing composition.
Modified opioids containing silicon
A modified opioid is provided comprising modified morphine molecules, wherein for each morphine molecule, one or more carbon atoms are replaced with silicon atoms. A method is further provided for modifying an opioid comprising morphine molecules, said method comprising the step of replacing one or more carbon atoms with silicon atoms.
Modified opioids containing silicon
A modified opioid is provided comprising modified morphine molecules, wherein for each morphine molecule, one or more carbon atoms are replaced with silicon atoms. A method is further provided for modifying an opioid comprising morphine molecules, said method comprising the step of replacing one or more carbon atoms with silicon atoms.
Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same
Provided are a novel cyclodisilazane derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the cyclodisilazane derivative having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under a pressure where handling is easy, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.