Provided are a novel cyclodisilazane derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the cyclodisilazane derivative having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under a pressure where handling is easy, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.

One-pot synthetic methods are disclosed for synthesizing curable, antimicrobial silsesquioxane-silica hybrids by hydrolytically co-condensing a tetraalkoxysilane with two different trialkoxysilanes. Particles are also disclosed that are substantially spherical and have an ordered lamellar internal structure. In addition, polymers prepared front the curable, antimicrobial silsesquioxane-silica hybrids and co-monomers are disclosed.

One-pot synthetic methods are disclosed for synthesizing curable, antimicrobial silsesquioxane-silica hybrids by hydrolytically co-condensing a tetraalkoxysilane with two different trialkoxysilanes. Particles are also disclosed that are substantially spherical and have an ordered lamellar internal structure. In addition, polymers prepared front the curable, antimicrobial silsesquioxane-silica hybrids and co-monomers are disclosed.

An aqueous, storage-stable and preferably colorless composition containing N-vinylbenzylaminoalkyl-functional siloxanols is derived from a reaction of hydrolysis products and optionally, condensation products of hydrolysis products, of at least one aminoalkyl-functional alkoxysilane or a mixture of aminoalkyl-functional alkoxysilanes with vinylbenzyl halide. The composition contains not less than 1% by weight of N-vinylbenzylaminoalkyl-functional siloxanols and/or salts of the protonated N-vinylbenzylaminoalkyl-functional siloxanols and water, based on the weight of the composition. The composition has a pH of 2 to 3.5. A process can be used for producing this composition.

Provided is a method for producing a cyclic polysilane compound simply and easily in a higher yield. The method for producing a cyclic polysilane compound according to an embodiment of the present invention comprising a reaction step of adding a silane monomer compound represented by Formula (I) below into a liquid mixture containing metallic sodium and a lithium salt and allowing them to react: ##STR00001##
where, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a hydrocarbon group, an alkoxy group, or a halogen atom, X.sup.1 and X.sup.2 each independently represent a halogen atom or an alkoxy group, and n.sub.1 is an integer that is greater than or equal to 1.

Provided is a method for producing a cyclic polysilane compound simply and easily in a higher yield. The method for producing a cyclic polysilane compound according to an embodiment of the present invention comprising a reaction step of adding a silane monomer compound represented by Formula (I) below into a liquid mixture containing metallic sodium and a lithium salt and allowing them to react: ##STR00001##
where, R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a hydrocarbon group, an alkoxy group, or a halogen atom, X.sup.1 and X.sup.2 each independently represent a halogen atom or an alkoxy group, and n.sub.1 is an integer that is greater than or equal to 1.

Low to moderate temperature vapor deposition processes are provided for the deposition of silicon-based thin films, such as silicon nitride films, silicon carbonitride films, silicon oxide films, and silicon films. The processes includes in a single cycle, heating a substrate to a predetermined temperature; providing a precursor containing an N-alkyl substituted perhydridocyclotrisilazane in the vapor phase to a reaction zone containing the substrate, forming a monolayer of the precursor by adsorption to the substrate surface, and exposing the adsorbed monolayer on the substrate in the reaction zone to a remote or direct soft plasma of a co-reactant. The adsorbed precursor monolayer reacts with the soft plasma and undergoes conversion to a discrete atomic or molecular layer of a silicon-based thin film via dissociation and/or decomposition due to or enabled by a substrate surface-induced process. The cycle is then repeated to form a silicon-based thin film of a desired thickness.

A method of separating analytes in a liquid sample includes flowing the liquid sample through a chromatography column configured for use in liquid chromatography. The chromatography column contains a composition that includes a solid support having an exterior surface, a ligand, and a linker. The ligand includes a polyhedral oligomeric silsesquioxane moiety. The linker is covalently bound to both the polyhedral oligomeric silsesquioxane moiety and the exterior surface of the solid support.

A method of separating analytes in a liquid sample includes flowing the liquid sample through a chromatography column configured for use in liquid chromatography. The chromatography column contains a composition that includes a solid support having an exterior surface, a ligand, and a linker. The ligand includes a polyhedral oligomeric silsesquioxane moiety. The linker is covalently bound to both the polyhedral oligomeric silsesquioxane moiety and the exterior surface of the solid support.

A method includes producing a substituted cyclosilane by combining in a solvent the following: (i) halogenated cyclosilane, (ii) at least one of tri-alkyl or tri-aryl silane, and (iii) a complexing agent that includes at least one of ammonium halide or phosphonium halide. The halogenated cyclosilane reacts to produce the substituted cyclosilane.