The invention relates to a method for producing at least one metal amino alcoholate, at least comprising the following steps (A) providing at least one amino alcohol, (B) adding at least one basic compound to the at least one amino alcohol provided in step (A) in order to obtain at least one corresponding amino alcoholate, and (C) adding at least one metal halogenide to the mixture obtained in step (C) in order to obtain a corresponding metal amino alcoholate, wherein in step (C) the at least one metal halogenide is added as a solution in a protic solvent at a concentration of 2.0 to 35.0 wt. %; a solution containing at least one metal alcoholate obtained in this manner; the use of the solution to produce a composition; a corresponding composition; the use of said composition to produce single- or multi-layer paint structures; a method for single- or multi-layer coating of a substrate with a paint structure; and a substrate coated in this manner.

An alkyl tin compound having an alkyl group bonded to a tin atom, wherein the alkyl group is a branched alkyl or cyclic group-substituted alkyl group, the branched alkyl group being an alkyl group branched at at least one carbon atom of the first to third carbon atoms counting from the tin atom, and the cyclic group-substituted alkyl group being an alkyl group having a cyclic group bonded at at least one carbon atom of the first to third carbon atoms counting from the tin atom.

A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′).sub.3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′.sub.2).sub.3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″).sub.3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

The present disclosure provides, inter alia, compounds to modulate GPX4 activity. Also provided are pharmaceutical compositions containing same compounds. Further provided are methods for treating or ameliorating the effects of a cancer in a subject, methods of modulating GPX activity in a subject, methods of inducing ferroptosis in a cell, and methods for treating or ameliorating the effects of a cancer in a subject using the compounds or composition in combination with other therapeutic agents.

Specific organometallic compounds of Formula I: Q.sub.x-Sn-(A.sup.1R.sup.1′.sub.z).sub.4-x or Formula II: Sn(NR.sup.2(CH.sub.2).sub.nA.sup.2).sub.2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive.

The invention relates to metal complex compounds of the formula M.sub.k(L).sub.x(Y).sub.kz-nx, where the ligand L has the formula (I), and to metal complex compounds which include the reaction product of at least one salt or a complex of a transition metal or a main group metal element of the groups 13 to 15 and at least one 1,3-ketoamide. Such complex compounds are suitable in particular as catalysts for polyurethane compositions. The invention also relates to two-component polyurethane compositions including at least one polyisocyanate as the first component, at least one polyol as the second component, and at least one such metal complex compound as the catalyst. The invention additionally relates to different uses of the two-component polyurethane compositions.

A supported alkoxylated organotin reactant, to the process for preparing same, to the use of such a reactant as a catalyst for heterogeneous-phase organic synthesis, and also to a process for heterogeneous-phase synthesis of 5-substituted or 1,5-disubstituted tetrazoles using such a reactant.

Described herein are photoresist compositions comprising a metal structure including an organometallic compound, an organometallic nanoparticle, and/or an organometallic cluster; a C2 to C20 organic densifier including oxygen atoms; and a solvent. Also described herein are methods of using a photoresist composition.

A semiconductor photoresist composition includes an organotin compound represented by Chemical Formula 1, and a solvent. A method for preparing the same, and a method of forming patterns utilizing the same are disclosed.

##STR00001##

Specific details of Chemical Formula 1 are as defined in the specification.

A semiconductor photoresist composition and a method of forming patterns utilizing the same are provided. The semiconductor photoresist composition includes a condensed product produced by a condensation reaction between an organotin compound represented by Chemical Formula 1 and at least one organic acid compound selected from a substituted organic acid, an organic acid including at least two acid functional groups, and a substituted or unsubstituted sulfonic acid; and a solvent.

##STR00001##

Specific details of Chemical Formula 1 are as defined in the specification.