Ionizable compounds, and compositions and methods of use thereof. The ionizable compounds can be used for making nanoparticle compositions for use in biopharmaceuticals and therapeutics. More particularly, the compounds, compositions and methods are to provide nanoparticles to encapsulate active agents, such as nucleic acid agents, and to deliver and distribute the active agents to cells, tissues, organs, and subjects.

This invention includes ionizable compounds, and compositions and methods of use thereof. The ionizable compounds can be used for making nanoparticle compositions for use in biopharmaceuticals and therapeutics. More particularly, this invention relates to compounds, compositions and methods for providing nanoparticles to encapsulate active agents, such as nucleic acid agents, and to deliver and distribute the active agents to cells, tissues, organs, and subjects.

This invention includes ionizable compounds, and compositions and methods of use thereof. The ionizable compounds can be used for making nanoparticle compositions for use in biopharmaceuticals and therapeutics. More particularly, this invention relates to compounds, compositions and methods for providing nanoparticles to encapsulate active agents, such as nucleic acid agents, and to deliver and distribute the active agents to cells, tissues, organs, and subjects.

An object of the present invention is to efficiently produce a target sodium salt from a phenol compound having two or more phenolic hydroxyl groups in a short time and at a high yield. The present invention relates to a method for producing a sodium salt of a phenol compound, including a step of mixing a phenol compound solution in which a phenol compound having two or more phenolic hydroxyl groups is dissolved and a sodium dispersion liquid in which sodium particles are dispersed.

An object of the present invention is to efficiently produce a target sodium salt from a phenol compound having two or more phenolic hydroxyl groups in a short time and at a high yield. The present invention relates to a method for producing a sodium salt of a phenol compound, including a step of mixing a phenol compound solution in which a phenol compound having two or more phenolic hydroxyl groups is dissolved and a sodium dispersion liquid in which sodium particles are dispersed.

The disclosure relates to an aqueous acidizing fluid. In addition to an acid, the fluid contains an organophosphorus surfactant and/or an acid retarder. The organophosphorus surfactant may be an amino phosphonate or a phosphino carboxylate. The acid retarder comprises the combination of urea or a urea derivative and a bifunctional organic compound. Suitable bifunctional organic compounds contain at least one quaternary ammonium or phosphonium and at least one alcohol as well as salts of nitrogen containing heterocyclic rings.

The disclosed and claimed subject matter is directed to an etching composition that includes (A) phosphoric acid and (B) a mixture that includes (i) a silicon-containing compound and (ii) an aqueous solvent. In some embodiments, the etching compositions include additional ingredients. The etching compositions are useful for the selective removal of silicon nitride over silicon oxide from a microelectronic device having such material(s) thereon during its manufacture.

The disclosed and claimed subject matter is directed to an etching composition that includes (A) phosphoric acid and (B) a mixture that includes (i) a silicon-containing compound and (ii) an aqueous solvent. In some embodiments, the etching compositions include additional ingredients. The etching compositions are useful for the selective removal of silicon nitride over silicon oxide from a microelectronic device having such material(s) thereon during its manufacture.

The disclosed and claimed subject matter is directed to an etching composition that includes (A) phosphoric acid and (B) a mixture that includes (i) a silicon-containing compound and (ii) an aqueous solvent. In some embodiments, the etching compositions include additional ingredients. The etching compositions are useful for the selective removal of silicon nitride over silicon oxide from a microelectronic device having such material(s) thereon during its manufacture.

The present invention relates to prevention of congenital deformations. The invention further relates to cancer inhibition and prevention. The invention further relates to methods and compositions to modulate, antagonize, or agonize disparate signaling pathways that may converge to regulate patterning events and gene expression during prenatal development, postnatal development, and during development in the adult, organism. The invention also relates to activators or deactivators of pyruvate kinase M2 (PKM2) for the treatment, prevention, or amelioration of diseases related to PKM2 function.