Patent classifications
C07F9/547
RESIST COMPOSITION AND PATTERNING PROCESS
A resist composition comprising a base polymer and a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane salt compound offers a high dissolution contrast, minimal LWR, and dimensional stability on PPD.
HETEROCYCLIC SELENAPHOSPHITES AND PROCESS FOR PREPARATION THEREOF
Novel heterocyclic selenaphosphites, process for preparation thereof and use thereof as ligand for employment in complexes.
HETEROCYCLIC SELENAPHOSPHITES AND PROCESS FOR PREPARATION THEREOF
Novel heterocyclic selenaphosphites, process for preparation thereof and use thereof as ligand for employment in complexes.
Nicotinamide mononucleotide derivatives and their uses
The invention relates to compositions of nicotinamide mononucleotide derivatives and their methods of use. The invention also relates to methods of preparing nicotinamide mononucleotide derivatives. The invention relates to pharmaceutical compositions and nutritional supplements containing a nicotinamide mononucleotide derivative. The invention relates to methods of using nicotinamide mononucleotide derivatives that promote the increase of intracellular levels of nicotinamide adenine dinucleotide (NAD+) in cells and tissues for treating diseases and improving cell and tissue survival.
Nicotinamide mononucleotide derivatives and their uses
The invention relates to compositions of nicotinamide mononucleotide derivatives and their methods of use. The invention also relates to methods of preparing nicotinamide mononucleotide derivatives. The invention relates to pharmaceutical compositions and nutritional supplements containing a nicotinamide mononucleotide derivative. The invention relates to methods of using nicotinamide mononucleotide derivatives that promote the increase of intracellular levels of nicotinamide adenine dinucleotide (NAD+) in cells and tissues for treating diseases and improving cell and tissue survival.