Aspects of this disclosure pertain to a colorless material that includes a carrier, copper-containing particles, and either one or both of sodium thiocyanate and titanium dioxide. In one or more embodiments, the material exhibits, in the CIE L*a*b* system, an L* value in the range from about 91 to about 100, and a C* value of less than about 7, wherein C* equals √(a*.sup.2+b*.sup.2). In some embodiments, the material exhibits a greater than 3 log reduction in a concentration of Staphylococcus aureus, under the EPA Test Method for Efficacy of Copper Alloy as a Sanitizer testing conditions.

Aspects of this disclosure pertain to a colorless material that includes a carrier, copper-containing particles, and either one or both of sodium thiocyanate and titanium dioxide. In one or more embodiments, the material exhibits, in the CIE L*a*b* system, an L* value in the range from about 91 to about 100, and a C* value of less than about 7, wherein C* equals √(a*.sup.2+b*.sup.2). In some embodiments, the material exhibits a greater than 3 log reduction in a concentration of Staphylococcus aureus, under the EPA Test Method for Efficacy of Copper Alloy as a Sanitizer testing conditions.

Aspects of this disclosure pertain to a colorless material that includes a carrier, copper-containing particles, and either one or both of sodium thiocyanate and titanium dioxide. In one or more embodiments, the material exhibits, in the CIE L*a*b* system, an L* value in the range from about 91 to about 100, and a C* value of less than about 7, wherein C* equals √(a*.sup.2+b*.sup.2). In some embodiments, the material exhibits a greater than 3 log reduction in a concentration of Staphylococcus aureus, under the EPA Test Method for Efficacy of Copper Alloy as a Sanitizer testing conditions.

Biocidal coatings include flake shaped particles that are deposed with a vertical orientation to form a coating which is biocidal to pathogens including viruses, bacteria, biofilms, fungi, microbes, algae, and other pathogens. In some embodiments, the pathogen membrane becomes lacerated when contacting the blade shaped flake particle. In other embodiments, a flake shaped particle which is a semiconductor generates radicals, or hydroxyls, or oxidizers, which transit to pathogens, and stress or deactivate the pathogens. In still more embodiments, this generation of radicals, hydroxyls, or oxidizers by the semiconductive flake shaped particle is increased with light irradiation.

Biocidal coatings include flake shaped particles that are deposed with a vertical orientation to form a coating which is biocidal to pathogens including viruses, bacteria, biofilms, fungi, microbes, algae, and other pathogens. In some embodiments, the pathogen membrane becomes lacerated when contacting the blade shaped flake particle. In other embodiments, a flake shaped particle which is a semiconductor generates radicals, or hydroxyls, or oxidizers, which transit to pathogens, and stress or deactivate the pathogens. In still more embodiments, this generation of radicals, hydroxyls, or oxidizers by the semiconductive flake shaped particle is increased with light irradiation.

Combinations of a nitroprusside, such as sodium nitroprusside (SNP; Na.sub.2[Fe(CN).sub.5NO].2H.sub.2O) and a nitrate, are provided, together with methods for the combined use of the nitroprusside and the nitrate as metabolic inhibitors of microbial cultures. The microbial cultures may include sulfate reducing bacteria (SRB) in aqueous culture. This metabolic inhibition may for example be implemented in the presence of a hydrocarbon, for example in an oil reservoir or in oil field systems and facilities. When applied to an SRB culture in the presence of a hydrocarbon, the combination of the nitroprusside and the nitrate may accordingly be used to ameliorate the biological formation of sulfides, particularly hydrogen sulfide.

Combinations of a nitroprusside, such as sodium nitroprusside (SNP; Na.sub.2[Fe(CN).sub.5NO].2H.sub.2O) and a nitrate, are provided, together with methods for the combined use of the nitroprusside and the nitrate as metabolic inhibitors of microbial cultures. The microbial cultures may include sulfate reducing bacteria (SRB) in aqueous culture. This metabolic inhibition may for example be implemented in the presence of a hydrocarbon, for example in an oil reservoir or in oil field systems and facilities. When applied to an SRB culture in the presence of a hydrocarbon, the combination of the nitroprusside and the nitrate may accordingly be used to ameliorate the biological formation of sulfides, particularly hydrogen sulfide.

The invention is concerned with a pharmaceutical and industrial iodophor preparation, its synthesis and potential applications. The compound has predictable antimicrobial activities. Furthermore, this iodophor is much more stable in the presence of organic material than traditional iodophors. The compositions release free iodine when in solution, which provides the antimicrobial activity.

The invention is concerned with a pharmaceutical and industrial iodophor preparation, its synthesis and potential applications. The compound has predictable antimicrobial activities. Furthermore, this iodophor is much more stable in the presence of organic material than traditional iodophors. The compositions release free iodine when in solution, which provides the antimicrobial activity.

A method for preparing a bactericidal film having a titanium carbonitride carrier layer on metal comprising preprocessing, polishing, plating a bactericidal film carrier layer and a bactericidal film. The surface of the polished metal is smooth. During the plating process, as silver ions do not react with carbon and nitrogen, through changing the number of carbon and nitrogen atoms, various desired colors of the bactericidal film may be achieved. Subsequently, a nano silver sputtering target is initiated, which enables silver ions with bactericidal effect to be uniformly distributed in the titanium carbonitride film layer, thus forming a colored bactericidal film with bactericidal effect. The workpiece is hung on the hanging rack during the plating process, which allows the rotation and revolution of the workpiece to be simultaneously achieved, thus realizing a uniform plating during the target's sputtering while avoiding damage to the workpiece due to local high temperature.