The present invention particularly relates to synthesizing photo-initiators having poly-oligo-silsesquioxane (POSS) structure and realizing photo-polymerization by using these photo-initiators and simultaneous and in-situ synthesis of Ag nano-particles in polymer matrix comprising POSS structure and obtaining wrinkled surfaces as a result of self-arranging thereof.

The polymerizable composition contains: a) a polymerizable compound having one or two or more polymerizable groups and satisfying formula (I):

Re(450 nm)/Re(550 nm)<1.0  (I);

b) at least one photopolymerization initiator selected from the group consisting of alkylphenone-based compounds, acylphosphine oxide-based compounds, and oxime ester-based compounds; and c) a polymerization inhibitor. The present invention also provides an optically anisotropic body, a retardation film, an antireflective film, and a liquid crystal display device that are produced using the polymerizable liquid crystal composition. The polymerizable composition of the present invention is excellent in solubility and has high storage stability, so that no precipitation of crystals etc. occurs. When a film-shaped polymer is produced by polymerizing the above composition, the unevenness of the surface of the coating film is small while the alignment of the liquid crystal is maintained, and high durability is obtained. Therefore, the polymerizable composition is useful.

A curable composition comprising the components (i) 0 to 60 wt % non-ionic crosslinker(s); (ii) 20 to 85 wt % curable ionic compound(s) comprising an anionic group and at least one ethylenically unsaturated group; (iii) 15 to 45 wt % solvent(s); (iv) 0 to 10 wt % of photoinitiator(s); and (v) 2 to 45 wt % of structure modifier(s); wherein the molar ratio of component (v):(ii) is 0.25 to 0.65. The compositions are useful for preparing membranes for (reverse) electrodialysis.

A curable composition comprising the components (i) 0 to 60 wt % non-ionic crosslinker(s); (ii) 20 to 85 wt % curable ionic compound(s) comprising an anionic group and at least one ethylenically unsaturated group; (iii) 15 to 45 wt % solvent(s); (iv) 0 to 10 wt % of photoinitiator(s); and (v) 2 to 45 wt % of structure modifier(s); wherein the molar ratio of component (v):(ii) is 0.25 to 0.65. The compositions are useful for preparing membranes for (reverse) electrodialysis.

An object of the present invention is to provide a curable composition comprising a fluorescent particle containing a perovskite compound, wherein a decrease in the quantum yield of a film formed by curing the curable composition due to heat can be suppressed; a film formed by curing the curable composition; and a laminated body and a display apparatus comprising the film. Provided are a curable composition comprising a fluorescent particle (A) containing a perovskite compound, a photopolymerizable compound (B), a photopolymerization initiator (C), and an antioxidant (D); a film formed by curing the curable composition; and a laminated body and a display apparatus comprising the film.

Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.

Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.

One aspect of the present invention provides a photocurable resin composition for a surgical guide, which comprises 20 to 50 parts by weight of (meth)acrylate-based urethane copolymer; 40 to 70 parts by weight of a first (meth)acrylate-based monomer; 4 to 9 parts by weight of a second (meth)acrylate-based monomer; 1 to 4 parts by weight of a photoinitiator; and 0.005 to 1 parts by weight of a UV absorber, a surgical guide manufactured therefrom, and a method for manufacturing the same.

A preparation process for a solid acrylic resin suitable for a UV curing system is a bulk polymerization method and comprises the steps: adding 100 parts by mass of at least one monofunctional monomer(s) having one polymerizable double bond per molecule, 1-10 parts by mass of one difunctional monomer having two polymerizable double bonds per molecule, 0.1-5.0 parts by mass of an initiator and 1-10 parts by mass of a chain transfer agent to a bulk polymerization reactor capable of water bath heating; homogenizing them by stirring; and then heating the bulk polymerization reactor with a constant temperature water bath at 40-90° C. until the polymerization reaction is completed.

A preparation process for a solid acrylic resin suitable for a UV curing system is a bulk polymerization method and comprises the steps: adding 100 parts by mass of at least one monofunctional monomer(s) having one polymerizable double bond per molecule, 1-10 parts by mass of one difunctional monomer having two polymerizable double bonds per molecule, 0.1-5.0 parts by mass of an initiator and 1-10 parts by mass of a chain transfer agent to a bulk polymerization reactor capable of water bath heating; homogenizing them by stirring; and then heating the bulk polymerization reactor with a constant temperature water bath at 40-90° C. until the polymerization reaction is completed.