Provided is a photocurable composition including a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule; a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule; a component (C) which is a compound containing two or more thiol groups in one molecule; a component (D) which is a photoradical generator; and a component (E) which is a photobase generator, in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.

The invention relates to a method for producing an adhesive bond by means of an adhesive, wherein a composition containing at least a substance reactive in a radical polyreaction and a catalytically active substance is used as the adhesive, wherein at least one metal complex from the group of the metal phthalocyanines and/or from the group of the metal porphyrins is selected as the catalytically active substance, wherein a polyreaction of the reactive substance occurs, which polyreaction is initiated by the application of a plasma.

The invention relates to a method for producing an adhesive bond by means of an adhesive, wherein a composition containing at least a substance reactive in a radical polyreaction and a catalytically active substance is used as the adhesive, wherein at least one metal complex from the group of the metal phthalocyanines and/or from the group of the metal porphyrins is selected as the catalytically active substance, wherein a polyreaction of the reactive substance occurs, which polyreaction is initiated by the application of a plasma.

Provided is a photocurable composition including a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule; a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule; a component (C) which is a compound containing two or more thiol groups in one molecule; a component (D) which is a photoradical generator; and a component (E) which is a photobase generator, in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.

Provided is a photocurable composition including a component (A) which is an acrylic ester compound containing one or more acryloyl groups in one molecule; a component (B) which is an acrylic ester compound containing one or more acryloyl groups and one or more epoxy groups in one molecule; a component (C) which is a compound containing two or more thiol groups in one molecule; a component (D) which is a photoradical generator; and a component (E) which is a photobase generator, in which a ratio between a total mass of the component (A) and the component (B) and a mass of the component (C) is in a range of 67.8:32.2 to 88.0:12.0, inclusive.

Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

A plasma chamber (11) for coating a substrate with a polymer layer, the plasma chamber includes a first electrode set (14) and a second electrode set (14), the first and second electrode sets are arranged either side of a sample chamber for receiving a substrate, wherein the first and second electrode sets include plural electrode layers (141, 142) and wherein each electrode set includes plural radiofrequency electrode layers or plural ground electrode layers for coating polymer to each surface of a substrate.

Provided is a water-based coating composition capable of forming a multilayer coating film having an excellent finished appearance and having excellent storage stability. A water-based coating composition to be used as a water-based first colored coating (X) in a 3-coat-1-bake multilayer coating formation method which sequentially applies a water-based first colored coating (X), a water-based second colored coating (Y), and a clear coating (Z) and heats and cures the obtained three-layer multilayer coating film simultaneously, wherein the water-based coating composition contains at least one resin selected from acrylic resins (A) and polyester resins (B), a curing agent (C), and urethane resin particles (D) obtained from structural components including a polyisocyanate component (d1) containing at least one diisocyanate (d1-1) selected from xylylene diisocyanate and hydrogenated xylylene diisocyanate and a polyol component (d2).

Ionizing radiation crosslinkable pressure sensitive adhesive precursors containing hydrocarbon tackifiers and having an acid content of no more than 3% by weight. The precursors can be exposed to a source of ionizing radiation, for example, one or both of an electron beam or gamma radiation, for an exposure time sufficient to receive an energy dose sufficient to at least partially crosslink the adhesive precursor, thereby forming a pressure sensitive adhesive. Methods of using ionizing radiation to crosslink a crosslinkable pressure sensitive adhesive precursor are also disclosed.