The present specification relates to a polymer including a unit represented by Chemical Formula 1, a coating composition including the same, and an organic light emitting device formed using the same.

Compositions for providing a dielectric layer in an electronic device wherein the composition comprises a polymer which polymer contains one or more building blocks, wherein at least 25 mol % of the total number of building blocks in the polymer are of the general formula having olefinic oligo-dihydrodicyclopentadienyl functionalities.

Compositions for providing a dielectric layer in an electronic device wherein the composition comprises a polymer which polymer contains one or more building blocks, wherein at least 25 mol % of the total number of building blocks in the polymer are of the general formula having olefinic oligo-dihydrodicyclopentadienyl functionalities.

A method of synthesizing a water-dispersible conductive polymeric composite comprising mixing an aqueous suspension comprising optionally substituted azulene monomers and a dopant precursor such as polystyrene sulfonic acid with an oxidizing agent and a catalyst to form a doped poly(azulene) suspension wherein the poly(azulene)/dopant molar ratio is 1:1 to 1:6. The doped poly(azulene) suspension is then contacted with acidic and basic resins to remove the oxidizing agent and catalyst. The resulting suspension is then filtered through a membrane such as polyvinylidene fluoride (PVDF) to afford a purified suspension comprising the water-dispersible conductive polymeric composite. A water-dispersible conductive polymeric composite comprising an optionally substituted poly(azulene) doped by a dopant such as polystyrene sulfonate wherein the poly(azulene)/dopant molar ratio is 1:1 to 1:6 is also disclosed.

Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.

Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.

A monomer having formula (A) is provided. R.sup.A is H, methyl or trifluoromethyl, X.sup.1 is a single bond, ether, ester or amide bond, R.sup.a is a C.sub.1-C.sub.20 monovalent hydrocarbon group, R.sup.b is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1n+m4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV. ##STR00001##

A monomer having formula (A) is provided. R.sup.A is H, methyl or trifluoromethyl, X.sup.1 is a single bond, ether, ester or amide bond, R.sup.a is a C.sub.1-C.sub.20 monovalent hydrocarbon group, R.sup.b is H or an acid labile group, X is halogen, n is an integer of 1 to 4, m is an integer of 0 to 3, and 1n+m4. A resist composition comprising a polymer derived from the monomer has a high sensitivity to high-energy radiation, especially EUV. ##STR00001##

The present invention provides a novel polymer comprising a repeating unit represented by the following Chemical Formula 1, and an organic light emitting device including the same:

##STR00001##

Wherein L.sub.1, L.sub.2, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1 to R.sub.8, o, p and n are described herein.

Disclosed is a light-emitting layer-forming ink useful in forming an organic light-emitting layer for an organic EL element by a printing process, including a tetralin-based organic solvent, and a solute including an anthracene-based, low molecular material and dissolved at a concentration of 3% or higher and 12% or lower in the tetralin-based organic solvent.