The optical fibers disclosed is a single mode optical fiber comprising a core region and a cladding region surrounding and directly adjacent to the core region. The core region can have a radius r.sub.1 in a range from 3 μm to 7 μm and a relative refractive index profile Δ.sub.1 having a maximum relative refractive index Δ.sub.1max in the range from 0.25% to 0.50%. The cladding region can include a first outer cladding region and a second outer cladding region surrounding and directly adjacent to the first outer cladding region. The first outer cladding region can have a radius r.sub.4a. The second outer cladding region can have a radius rob less than or equal to 45 μm and comprising silica based glass doped with titania.

A disclosed multimode optical fiber comprises a core and a cladding surrounding the core. The core has an outer radius r.sub.1 in between 20 μm and 30 μm. The cladding includes a first outer cladding region having an outer radius r.sub.4a and a second outer cladding region having an outer radius r.sub.4b less than or equal to 45 μm. The second outer cladding region comprises silica-based glass doped with titania. The optical fiber further includes a primary coating with an outer radius r.sub.5 less than or equal to 80 μm, and a thickness (r.sub.5−r.sub.4) less than or equal to 30 μm. The optical fiber further includes a secondary coating with an outer radius r.sub.6 less than or equal to 100 μm. The secondary coating has a thickness (r.sub.6−r.sub.5) less than or equal to 30 μm, and a normalized puncture load greater than 3.6×10.sup.−3 g/micron.sup.2.

A photocurable composition for stereolithographic three-dimensional printing, wherein the photocurable composition comprises a photoreactive oligomer component comprising a hydrophobic oligomer comprising a photoreactive end group, a photoreactive monomer component comprising a photoreactive monomer having a photoreactive end group, and a photoinitiation composition comprising a photoinitiator; the photocurable composition has a viscosity of 250 to 10,000 centipoise at 22° C., determined using a Brookfield viscometer; and the photocured composition has a dielectric loss of less than 0.010, preferably less than 0.008, more preferably less than 0.006, most preferably less than 0.004, each determined by split-post dielectric resonator testing at 10 gigahertz at 23° C.

The disclosure provides recording materials including aromatic substituted alkane-core derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several structures are disclosed, including Formula I. When used in Bragg gratings applications, the monomers and polymers disclosed lead to materials with higher refractive index, low birefringence, and high transparency. The disclosed derivatized monomers and polymers can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.

A UV-curable and recyclable thermoset shape memory polymer is provided. The polymer includes a vitrimer-based monomer and a photoinitiator. The vitrimer-based monomer includes a first unit rendering a high chain stiffness upon polymerization of the monomer, and a second photopolymerizable unit for photopolymerization of the monomer under a UV irradiation. The polymer has high strength, high stiffness, high recovery stress, high energy storage, reasonable recycling efficiency, and is printable using SLA with high resolution.

Described herein are methods and compositions relating to tunable nanoporous coatings. In certain aspects, described herein are methods and compositions wherein a tunable nanoporous coating comprises a tunable nanoporous membrane which transitions from opaque to transparent upon the application of force, and from transparent to opaque after washing with a solvent.

A resin composition for stereolithography that can reduce generation of color unevenness and provide excellent formability is provided. The resin composition for stereolithography includes an ultraviolet curable resin (A) and an inorganic pigment (B) that are blended, in which the inorganic pigment (B) has a specific gravity of 2.0≤ρ and a particle size distribution of a particle diameter of D50≤5 μm and D90≤20 μm, and a viscosity of the resin composition for stereolithography at 25° C. is 100 Pa.Math.s or more.

Additive manufacturing compositions include low-absorbing particles or non-absorbing particles that have an absorbance for wavelengths of 300 nm to 700 nm that is equal to or greater than 0 Au and is less 1.0 Au, such as 0.001 Au≤absorbance≤0.7 Au. Slurries including such particles and an uranium-containing particle and that are used in additive manufacturing processes have an increased penetration depth for curative radiation. Removal of low-absorbing particles or non-absorbing particles during post-processing of as-manufactured products results in pores that create porosity in the as-manufactured product that provide a volume accommodating fission gases and/or can enhance wicking of certain heat pipe coolant liquids. Low-absorbing particles or non-absorbing particles can be functionalized for improved properties, for example, with fissionable material for improved ceramic yields, with burnable poisons or stabilizers for increased homogeneity, with stabilizers for localized delivery of the stabilizer, or with combinations thereof.

Disclosed are a solvent-free curable composition including quantum dots; and a curable monomer represented by Chemical Formula 1, a cured layer manufactured using the composition, a color filter including the cured layer, and a display device including the color filter.

##STR00001##

In Chemical Formula 1, each substituent is as defined in the specification.

Compounds of formula (I) are photoinitiators or photosensitizers in a photopolymerizable composition: ##STR00001## R.sub.1 represents a monovalent, linear, branched or cyclic, aliphatic hydrocarbon group having 1 to 20 carbon atoms, optionally substituted with substituent(s) selected from —Cl, —Br, —OH, ═O, —NH—CO— OR.sub.2, —NH—CO—R.sub.2 or free-radically or ionically polymerizable groups. Each R.sub.2 is independently —H or C.sub.1-6 alkyl; n is ≥1. If n=1, Z and Y are absent and X represents —OR.sub.3; if n is >1, Z represents —OR.sub.4—, Y represents —ORs— and X represents —H or —OH. R.sub.3 represents —H or R.sub.1; and R.sub.4 and R.sub.5 each independently represent a bivalent hydrocarbon group. The polymerizable moieties as optional substituents of R.sub.1 are polymerizable double or triple bonds, lactam, lactone and epoxide moieties, which are subjectable to ring-opening polymerization; and two of R.sub.1 to R.sub.5 may be linked to one another to form a ring or a dimer.