A method of forming a resist pattern, including: step A in which a first resist pattern is formed on a substrate, step B in which a basic composition is applied to cover the first resist pattern, step C in which a base contained in the basic composition and the first resist pattern are neutralized to form a developing solution insoluble region on a surface of the first resist pattern, and step D in which the covered first resist pattern is developed, the basic composition containing a basic component, and the basic component containing a polymeric compound having a structural unit (x0) represented by general formula (x0-1) (R is H, C.sub.15 alkyl group, C.sub.15 halogenated alkyl group; Vx.sup.01 is divalent hydrocarbon group having ether bond or amide bond or divalent aromatic hydrocarbon group; Yx.sup.01 is single bond or divalent linking group; Rx.sup.1 is substituent having nitrogen atom). ##STR00001##

A method of forming a resist pattern, including: step A in which a first resist pattern is formed on a substrate, step B in which a basic composition is applied to cover the first resist pattern, step C in which a base contained in the basic composition and the first resist pattern are neutralized to form a developing solution insoluble region on a surface of the first resist pattern, and step D in which the covered first resist pattern is developed, the basic composition containing a basic component, and the basic component containing a polymeric compound having a structural unit (x0) represented by general formula (x0-1) (R is H, C.sub.15 alkyl group, C.sub.15 halogenated alkyl group; Vx.sup.01 is divalent hydrocarbon group having ether bond or amide bond or divalent aromatic hydrocarbon group; Yx.sup.01 is single bond or divalent linking group; Rx.sup.1 is substituent having nitrogen atom). ##STR00001##

There are described a dispersion of polymeric beads where the beads comprise a copolymer composition comprising (preferably consisting essentially of): copolymers (and processes for making them) comprising (a) at least 8.5 wt-% preferably >=20 wt-% of a higher itaconate diester (preferably dibutyl itaconateDBI); (b) less than 23 wt-% acid monomer but also sufficient to have an acid value less than 150 mg KOH/g of polymer, (c) optionally with less than 50 wt-% of other itaconate monomers, and (d) optionally less than 77 wt-% of other monomers not (a) to (c). The DBI may be biorenewable. A further embodiment is an aqueous suspension polymerization process for preparing vinyl polymer beads from olefinically unsaturated monomers and a free-radical initiator, where at least 10 wt-% of the monomer is DBI.

There are described a dispersion of polymeric beads where the beads comprise a copolymer composition comprising (preferably consisting essentially of): copolymers (and processes for making them) comprising (a) at least 8.5 wt-% preferably >=20 wt-% of a higher itaconate diester (preferably dibutyl itaconateDBI); (b) less than 23 wt-% acid monomer but also sufficient to have an acid value less than 150 mg KOH/g of polymer, (c) optionally with less than 50 wt-% of other itaconate monomers, and (d) optionally less than 77 wt-% of other monomers not (a) to (c). The DBI may be biorenewable. A further embodiment is an aqueous suspension polymerization process for preparing vinyl polymer beads from olefinically unsaturated monomers and a free-radical initiator, where at least 10 wt-% of the monomer is DBI.

Polymer particle embolics and methods of making same are described. The particle embolics can be used as embolization agents.

There is described an aqueous urethane acrylate copolymer dispersion comprising a) from 10 to 95 wt-% of a polyurethane copolymer, and b) from 5 to 90 wt-% of a polyvinyl copolymer, where vinyl copolymer (b) comprises from 30 parts to 100 parts by weight of biorenewable monomer(s)such as itaconic acid, itaconate diesters and/or diamides for example dimethyl itaconate (DMI) or dibutyl itaconate (DBI) and where optionally the composition has a residual monomer level of less than 5000 ppm.

There is described an aqueous urethane acrylate copolymer dispersion comprising a) from 10 to 95 wt-% of a polyurethane copolymer, and b) from 5 to 90 wt-% of a polyvinyl copolymer, where vinyl copolymer (b) comprises from 30 parts to 100 parts by weight of biorenewable monomer(s)such as itaconic acid, itaconate diesters and/or diamides for example dimethyl itaconate (DMI) or dibutyl itaconate (DBI) and where optionally the composition has a residual monomer level of less than 5000 ppm.

Provided are a curable composition including an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater, a functional polymer hardened product, a stack or a device including a functional polymer membrane, an amide compound, and a manufacturing method thereof.

##STR00001##

m represents an integer of 1 or greater, n represents an integer of 2 or greater, L.sup.1 represents a m+1-valent linking group, and L.sup.2 represents an n-valent linking group. R.sup.1 represents a hydrogen atom or an alkyl group, and R.sup.2 represents SO.sub.3.sup.M.sup.+ or SO.sub.3R.sup.3 (R.sup.3 represents an alkyl group or an aryl group). Here, in a case where there are plural R.sup.2's, not all of the R.sup.2's are SO.sub.3R.sup.3. M.sup.+ represents a hydrogen ion, an inorganic ion, or an organic ion.

Provided are a curable composition including an amide compound that is represented by Formula (1) below and of which a density of sulfonic acid is 3.9 milliequivalent/g or greater, a functional polymer hardened product, a stack or a device including a functional polymer membrane, an amide compound, and a manufacturing method thereof.

##STR00001##

m represents an integer of 1 or greater, n represents an integer of 2 or greater, L.sup.1 represents a m+1-valent linking group, and L.sup.2 represents an n-valent linking group. R.sup.1 represents a hydrogen atom or an alkyl group, and R.sup.2 represents SO.sub.3.sup.M.sup.+ or SO.sub.3R.sup.3 (R.sup.3 represents an alkyl group or an aryl group). Here, in a case where there are plural R.sup.2's, not all of the R.sup.2's are SO.sub.3R.sup.3. M.sup.+ represents a hydrogen ion, an inorganic ion, or an organic ion.

Ink contains at least one of a compound represented by the following chemical formula 1, a compound represented by chemical formula 2, a compound represented by chemical formula 3, or a compound represented by chemical formula 4.

##STR00001##