Chain scission resist compositions suitable for EUV lithography applications may include monomer functional groups that improve the kinetics and/or thermodynamics of the scission mechanism. Chain scission resists may include monomer functional groups that reduce the risk that leaving groups generated through the scission mechanism may chemically corrode processing equipment.

Articles and methods related to the manufacture of polymers containing labile crosslinking moieties are generally described.

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

Acoustically responsive particles and methods are provided for their use. Methods are provided for making and using tunable, monodisperse acoustically responsive particles and negative contrast acoustic particles, wherein the particles can contain a functional group available for covalent modification.

Acoustically responsive particles and methods are provided for their use. Methods are provided for making and using tunable, monodisperse acoustically responsive particles and negative contrast acoustic particles, wherein the particles can contain a functional group available for covalent modification.

Articles and methods related to the manufacture of polymers containing labile crosslinking moieties are generally described.

There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer M having a site contributing to dispersibility into a dispersion medium, a monomer M including a second functional group having reactivity with the first functional group, a charged monomer M by living polymerization without random copolymerizing the monomer M1 and the monomer M2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.

There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer M having a site contributing to dispersibility into a dispersion medium, a monomer M including a second functional group having reactivity with the first functional group, a charged monomer M by living polymerization without random copolymerizing the monomer M1 and the monomer M2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.

A compound has at least three functionalities, including a first functionality (a) that is a sulfonate group or a sulfate group of the formula —(O).sub.d—SO.sub.3M with d=0 or 1 and with M=hydrogen or a monovalent metal cation or a corresponding portion of a multivalent metal cation; a second functionality (b) that is a (meth)acryl residue; and a third functionality (c) that is a carboxylic acid function and/or a thioether group. When the compound is free of silicon, the sulfonate or sulfate group and the (meth)acryl residue are separated from each other by a hydrocarbon-containing residue having a carbon chain. The carbon chain is interrupted by S or NH, or the carbon chain contains a linking group, selected from C(O)NH, NHC(O), NR.sup.8C(O), NHC(O)O, NR.sup.8C(O)O, NHC(O)NH, C(O)NHC(O) and —C(O)S—, wherein R.sup.8 is alkyl or alkenyl or a (meth)acryl group.