Embodiments in accordance with the present invention encompass compositions comprising a long shelf stabilized organopalladium compound of formula (I) as described herein. The composition further contains a photoacid generator, a photosensitizer and one or more olefinic monomers as described herein. The shelf life of the compositions can further be extended by employing a stabilizer, such as for example, a hindered amine. The composition undergoes vinyl addition polymerization when it is exposed to a suitable actinic radiation to form a substantially transparent film or a three dimensional object. More specifically, the compositions of this invention are stable at room temperature for several days to several months and can also be stored at higher temperatures from about 40° C. to 60° C. for several days and undergo mass polymerization only when subjected to suitable actinic radiation. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films and/or three dimensional objects having various opto-electronic properties. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, sealants, adhesives, among others.

Embodiments in accordance with the present invention encompass compositions comprising a long shelf stabilized organopalladium compound of formula (I) as described herein. The composition further contains a photoacid generator, a photosensitizer and one or more olefinic monomers as described herein. The shelf life of the compositions can further be extended by employing a stabilizer, such as for example, a hindered amine. The composition undergoes vinyl addition polymerization when it is exposed to a suitable actinic radiation to form a substantially transparent film or a three dimensional object. More specifically, the compositions of this invention are stable at room temperature for several days to several months and can also be stored at higher temperatures from about 40° C. to 60° C. for several days and undergo mass polymerization only when subjected to suitable actinic radiation. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films and/or three dimensional objects having various opto-electronic properties. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, sealants, adhesives, among others.

The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.