Patent classifications
C08F32/06
Method of manufacturing patterned substrate
Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.
POLYMERS FROM BIS-ARYLCYCLOBUTENE GROUP CONTAINING MONOMERS THAT CURE THROUGH OTHER GROUPS AND METHODS FOR MAKING THE SAME
The present invention provides organic solvent soluble or aqueous alkali soluble polymer composition comprising, in copolymerized form, one or more bis-arylcyclobutene monomers and one or more olefin or dienophile group containing second monomers, wherein the polymer is substantially free of (unreacted) arylcyclobutene groups. The compositions cure by a separate from the B-staging reaction which consumes substantially all of the arylcyclobutene groups in the composition; and they cure at temperatures below the cure temperature of less than 210 C., preferably, less than 180 C. The polymer compositions find use in making films or coatings and are aqueous or organic solvent developable when used in photolithography. Methods for making the polymer compositions are also provided.
POLYMERS FROM BIS-ARYLCYCLOBUTENE GROUP CONTAINING MONOMERS THAT CURE THROUGH OTHER GROUPS AND METHODS FOR MAKING THE SAME
The present invention provides organic solvent soluble or aqueous alkali soluble polymer composition comprising, in copolymerized form, one or more bis-arylcyclobutene monomers and one or more olefin or dienophile group containing second monomers, wherein the polymer is substantially free of (unreacted) arylcyclobutene groups. The compositions cure by a separate from the B-staging reaction which consumes substantially all of the arylcyclobutene groups in the composition; and they cure at temperatures below the cure temperature of less than 210 C., preferably, less than 180 C. The polymer compositions find use in making films or coatings and are aqueous or organic solvent developable when used in photolithography. Methods for making the polymer compositions are also provided.
RESIN COMPOSITIONS
The present disclosure is directed to resins and to polymers, copolymers, and blends formed therefrom.
POLYMERS GRAFTED ONTO A METAL OXIDE SURFACE, METHOD OF GRAFTING POLYMERS ONTO A METAL OXIDE SURFACE, GRAFT POLYMER SUITABLE FOR THE METHOD
Metal oxide having a surface onto which a multitude of individual polymers are grafted, each polymer comprising an addition polymer having a first and a second end, and a first moiety comprising a terminal phosphonate group, which first moiety is bonded to the first end, which phosphonate group attaches to the metal oxide surface in such a way that the multitude of the grafted polymers comprises at least one group of adjacent polymers that have a stretched chain conformation wherein the adjacent stretched chains have a substantially parallel orientation, such that the polymers within said group together form a brush structure. Method of grafting a multitude of individual polymers onto a surface of a metal oxide.
POLYARYLENE RESIN COMPOSITIONS
Polyarylene oligomer compositions capable of curing at lower temperatures than conventional polyarylene oligomers are useful in forming dielectric material layers in electronics applications.
POLYARYLENE RESIN COMPOSITIONS
Polyarylene oligomer compositions capable of curing at lower temperatures than conventional polyarylene oligomers are useful in forming dielectric material layers in electronics applications.
POLYARYLENE RESINS
Certain cyclopentadienone monomers having polar moieties are useful in forming polyarylene resins having improved solubility in certain organic solvents and are useful in forming polyarylene resin layers in electronics applications.
POLYARYLENE RESINS
Certain cyclopentadienone monomers having polar moieties are useful in forming polyarylene resins having improved solubility in certain organic solvents and are useful in forming polyarylene resin layers in electronics applications.
Polymers derived from norbornadiene and maleic anhydride and use thereof
Embodiments encompassing a series of compositions containing polymers of norbornadiene and maleic anhydride monomers which are useful in forming a variety of photopatternable structures are disclosed and claimed. The compositions are useful as permanent dielectric materials. More specifically, embodiments encompassing compositions containing a series of ter- and tetrapolymers of a variety of norbornadiene, maleic anhydride, maleimide and norbornene-type cycloolefinic monomers in which maleic anhydride is fully or partially hydrolyzed (i.e., ring opened and fully or partially esterified), and a photoactive compound are disclosed, which are useful in forming permanent dielectric materials having utility in a variety of electronic material applications, among various other uses.