C08F36/20

Coating methods using organosilica materials and uses thereof

Methods for coating a substrate with a coating including an adsorbent material and a binder comprising an organosilica material which is a polymer comprising independent units of Formula [Z.sup.3Z.sup.4SiCH.sub.2].sub.3 (I), wherein each Z.sup.3 represents a hydroxyl group, a C.sub.1-C.sub.4 alkoxy group or an oxygen atom bonded to a silicon atom of another unit or an active site on the substrate and each Z.sup.4 represents a hydroxyl group, a C.sub.1-C.sub.4 alkoxy group, a C.sub.1-C.sub.4 alkyl group, an oxygen atom bonded to a silicon atom of another unit or an active site on the substrate are provided. Methods of gas separation are also provided.

COPOLYMER OF DIALLYLAMINES AND SULFUR DIOXIDE, AND METHOD FOR PRODUCING SAME
20180186937 · 2018-07-05 · ·

Provided are a copolymer of diallylamines and sulfur dioxide having a high molecular weight and a low content amount of impurities such as halogens, and a production method with which it is possible to produce such a copolymer relatively simply and at low cost. This problem is solved by: a copolymer having a weight-average molecular weight of 150,000 or higher obtained by GPC measurement and a degree of polymerization of 1000 or higher, the copolymer being obtained by copolymerizing sulfur dioxide and a sulfonate or alkyl sulfate salt of diallylamines having a specific structure; and a method for producing a copolymer, the method having a step for copolymerizing sulfur dioxide and a sulfonate or alkyl sulfate salt of diallylamines having a specific structure in ethylene glycol or in propylene glycol monomethyl ether.

Methods of separating aromatic compounds from lube base stocks

Methods are provided herein for separating an aromatic compound from a lube base stock by contacting a lube base stock containing an aromatic compound with an organosilica material.

Methods of separating aromatic compounds from lube base stocks

Methods are provided herein for separating an aromatic compound from a lube base stock by contacting a lube base stock containing an aromatic compound with an organosilica material.

Articles containing precisely branched functional polymeric phase change materials

A temperature regulating article comprises a substrate and a polymeric phase change material bound to the substrate, wherein the polymeric phase change material is characterized by including a precisely branched polymer with substantially equally spaced repeating sidechains. In other embodiments the polymeric phase change material includes between 20 and 200 branches per 1000 carbon units, has a latent heat of at least 5 Joules per gram, and a transition temperature between 0 C. and 40 C.

Articles containing precisely branched functional polymeric phase change materials

A temperature regulating article comprises a substrate and a polymeric phase change material bound to the substrate, wherein the polymeric phase change material is characterized by including a precisely branched polymer with substantially equally spaced repeating sidechains. In other embodiments the polymeric phase change material includes between 20 and 200 branches per 1000 carbon units, has a latent heat of at least 5 Joules per gram, and a transition temperature between 0 C. and 40 C.

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

A method for manufacturing a semiconductor device includes forming a photoresist layer including a photoresist composition over a substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. The photoresist composition includes a photoactive compound and a resin comprising a radical-active functional group and an acid labile group.

Resin, photoresist composition, and method of manufacturing semiconductor device

A method for manufacturing a semiconductor device includes forming a photoresist layer including a photoresist composition over a substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist. The photoresist composition includes a photoactive compound and a resin comprising a radical-active functional group and an acid labile group.

Metallocene complex, preparation method thereof and catalyst composition

This invention provides a metallocene complex and the preparation method thereof and a catalyst composition. This catalyst composition comprises a metallocene complex represented by formula (I) and an organic boron salt. Compared to the prior art, the catalyst used in this invention, which is the metallocene complex represented by formula (I), does not contain a group bonding between the heterocyclic fused cyclopentadienyl ring and the transition metal, and the coordination space of the central metal has a large opening degree. Therefore, the catalytic activity for more sterically hindered monomers is higher, and the comonomer incorporation is also higher. Furthermore, the metallocene complex represented by formula (I) used in this invention is a heterocyclic ring fused cyclopentadienyl ligand. Heterocyclic rings have relatively strong electron-donating capacity. By fusing a cyclopentadienyl group using heterocyclic rings, it is possible to change the electronic effect of the metal center and in turn increase the activity of catalyst. Therefore, by using the metallocene complex represented by formula (I), it is possible to prepare copolymers of ethylene with other olefins at high activity and high comonomer incorporation, and it is also possible to catalyze the polymerization of styrene and substituted styrene at high syndiotacticity and high activity. ##STR00001##

Metallocene complex, preparation method thereof and catalyst composition

This invention provides a metallocene complex and the preparation method thereof and a catalyst composition. This catalyst composition comprises a metallocene complex represented by formula (I) and an organic boron salt. Compared to the prior art, the catalyst used in this invention, which is the metallocene complex represented by formula (I), does not contain a group bonding between the heterocyclic fused cyclopentadienyl ring and the transition metal, and the coordination space of the central metal has a large opening degree. Therefore, the catalytic activity for more sterically hindered monomers is higher, and the comonomer incorporation is also higher. Furthermore, the metallocene complex represented by formula (I) used in this invention is a heterocyclic ring fused cyclopentadienyl ligand. Heterocyclic rings have relatively strong electron-donating capacity. By fusing a cyclopentadienyl group using heterocyclic rings, it is possible to change the electronic effect of the metal center and in turn increase the activity of catalyst. Therefore, by using the metallocene complex represented by formula (I), it is possible to prepare copolymers of ethylene with other olefins at high activity and high comonomer incorporation, and it is also possible to catalyze the polymerization of styrene and substituted styrene at high syndiotacticity and high activity. ##STR00001##