Provided is a method of forming fine patterns capable of minimizing LER and LWR to form high quality nanopatterns, by using a block copolymer having excellent etching selectivity. Provided is a block copolymer comprising a first block having a repeating unit represented by the following Chemical Formula 1, and a second block having a repeating unit represented by the following Chemical Formula 2:

##STR00001##

Disclosed are fluoropolymers with low CWST values and porous membranes made from the fluoropolymers. The fluoropolymer is made up of polymerized monomeric units of the formula A-XCH.sub.2B, wherein A is C.sub.6F.sub.13(CH.sub.2).sub.2, X is O or S, and B is vinylphenyl, and the fluoropolymer has a weight average molecular weight (Mw) of at least 100 Kd and/or a glass transition temperature of at least 33 C. copolymer. The porous membranes are suitable for degassing a variety of fluids.

The present disclosure relates to a passivation layer comprising a photocrosslinked fluoropolymer and a process for forming the layer. Passivation layers comprising the crosslinked fluoropolymer have low dielectric constants, low water absorptivity and are able to be photoimaged so as to provide the very fine features needed for modern electronic equipment.

To provide a terminal group conversion method and a terminal stabilizing method, which are capable of converting unstable terminal groups in a fluorinated polymer to carboxylic acid fluoride groups at a high conversion rate. A fluorinated polymer is heated at from 200 to 400 C. for at least one hour in the presence of at least 50 mol of molecular oxygen per 1 mol of unstable terminal groups in the fluorinated polymer, to convert from 50 to 100 mol % of the unstable terminal groups to carboxylic acid fluoride groups.

To provide a terminal group conversion method and a terminal stabilizing method, which are capable of converting unstable terminal groups in a fluorinated polymer to carboxylic acid fluoride groups at a high conversion rate. A fluorinated polymer is heated at from 200 to 400 C. for at least one hour in the presence of at least 50 mol of molecular oxygen per 1 mol of unstable terminal groups in the fluorinated polymer, to convert from 50 to 100 mol % of the unstable terminal groups to carboxylic acid fluoride groups.

Described herein is a composition comprising a fluorinated polysulfinic acid or a salt thereof having the following formula (I): ##STR00001##
wherein X.sub.1, X.sub.2, and X.sub.3 are independently selected from H, F, Cl, Br, I, CF.sub.3, and CH.sub.3 and wherein at least one of X.sub.1, X.sub.2, or X.sub.3 is H; R.sub.1 is a linking group; Z.sub.1 and Z.sub.2 are independently selected from Br, Cl, I, F, CF.sub.3, and a perfluorinated alkyl group; M is a cation; p is 0 or 1; and n is at least 2. Also described is a method of making the partially fluorinated polysulfinic acid or salt thereof.

Described herein is a composition comprising a fluorinated polysulfinic acid or a salt thereof having the following formula (I): ##STR00001##
wherein X.sub.1, X.sub.2, and X.sub.3 are independently selected from H, F, Cl, Br, I, CF.sub.3, and CH.sub.3 and wherein at least one of X.sub.1, X.sub.2, or X.sub.3 is H; R.sub.1 is a linking group; Z.sub.1 and Z.sub.2 are independently selected from Br, Cl, I, F, CF.sub.3, and a perfluorinated alkyl group; M is a cation; p is 0 or 1; and n is at least 2. Also described is a method of making the partially fluorinated polysulfinic acid or salt thereof.

Novel fluorocarbon polymers with a heteroaromatic group or a HPCA group are disclosed. A protonated fluoropolymer with a heteroaromatic group can be used as a cation-conductive electrolyte while an HPCA-based fluoropolymer encapsulating a H.sup.+ or Li.sup.+ can be employed as anion-transporting electrolyte.

A method for producing an iodine-containing compound includes reacting a halogen-containing organic iodine compound and a compound containing a reactive carbon-carbon double bond in the presence of a compound of Formula (21) or Formula (22). Each of R.sup.21, R.sup.23 and R.sup.24 represents a hydrogen atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; R.sup.22 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a boron-containing group; R.sup.25 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a silicon-containing group; and each of A.sup.1 and A.sup.2 represents a hydrogen atom, a chlorine atom, a bromine atom, or an iodine atom. ##STR00001##